SCHEMBL28832305

SCHEMBL28832305

CCCOCC=NC(N)=O

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.31
HCAR2 Q8TDS4 1/20 0.31
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28241235 0.83
SCHEMBL899170 0.76
SCHEMBL6936338 0.74
SCHEMBL8022534 0.72
SCHEMBL8022537 0.72
SCHEMBL36083 0.71
SCHEMBL21160000 0.69 MAPT (0.36) HCAR2HSD17B10
SCHEMBL28206555 0.69 MAPT (0.36) HCAR2HSD17B10
Urea SCHEMBL28739351 0.69 FAAH (0.34) HCAR2HSD17B10
SCHEMBL17244088 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115039029-A Negative photosensitive resin composition and method for producing cured relief pattern 旭化成株式会社 2022-09-09 CN disclosed