⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL449302 | 0.86 | — | — | |
| SCHEMBL2012862 | 0.86 | — | — | |
| Methane SCHEMBL15709419 | 0.80 | — | — | |
| SCHEMBL231188 | 0.62 | — | — | |
| Hydroxyamine SCHEMBL11177145 | 0.57 | — | — | |
| Water SCHEMBL7962034 | 0.57 | — | — | |
| SCHEMBL9705842 | 0.57 | — | — | |
| SCHEMBL10799457 | 0.57 | — | — | |
| SCHEMBL9219479 | 0.57 | — | — | |
| SCHEMBL8404066 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11127745-B2 | Devices, methods of forming a device, and memory devices | MICRON TECHNOLOGY, INC. (US) | 2021-09-21 | — | — | US | disclosed |
| US-20200321340-A1 | DEVICES, METHODS OF FORMING A DEVICE, AND MEMORY DEVICES | MICRON TECHNOLOGY INC (US) | 2020-10-08 | — | — | US | disclosed |
| US-10707212-B1 | Methods of forming an apparatus, and related apparatuses and electronic systems | MICRON TECHNOLOGY, INC. (US) | 2020-07-07 | — | — | US | disclosed |
| US-20200212046-A1 | METHODS OF FORMING AN APPARATUS, AND RELATED APPARATUSES AND ELECTRONIC SYSTEMS | MICRON TECHNOLOGY, INC. | 2020-07-02 | — | — | US | disclosed |
| US-9304389-B2 | Photomask and fabrication method thereof | UNITED MICROELECTRONICS CORP. (TW) | 2016-04-05 | — | — | US | disclosed |
| US-20150118602-A1 | PHOTOMASK AND FABRICATION METHOD THEREOF | UNITED MICROELECTRONICS CORP. (TW) | 2015-04-30 | — | — | US | disclosed |
| US-7709160-B2 | Method for manufacturing attenuated phase-shift masks and devices obtained therefrom | IMEC (BE) | 2010-05-04 | — | — | US | disclosed |
| US-7604906-B1 | photolithographic mask has a coverings of crystal growth inhibitor calcium fluoride (CaF2), magnesium fluoride (MgF2), barium fluoride (BaF2), beryllium fluoride (BeF2), strontium fluoride (SrF2) or radium fluoride (RaF2); low cost | KLA- TENCOR TECHNOLOGIES CORPORATION (US) | 2009-10-20 | — | — | US | disclosed |
| US-20070178392-A1 | Method for manufacturing attenuated phase-shift masks and devices obtained therefrom | IMEC (BE) | 2007-08-02 | — | — | US | disclosed |
| EP-1804119-A1 | Method for manufacturing attenuated phase- shift masks and devices obtained therefrom | Interuniversitair Microelektronica Centrum (BE) | 2007-07-04 | — | — | EP | disclosed |
| US-6994939-B1 | Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types | ADVANCED MICRO DEVICES, INC. (US) | 2006-02-07 | — | — | US | disclosed |
| US-6680150-B2 | Suppression of side-lobe printing by shape engineering | AGERE SYSTEMS INC. | 2004-01-20 | — | — | US | disclosed |
| US-6524755-B2 | Lithography | GRAY SCALE TECHNOLOGIES, INC. | 2003-02-25 | — | — | US | disclosed |
| US-20020177078-A1 | Proximity correction using shape engineering | BELL NORTHERN RESEARCH, LLC | 2002-11-28 | — | — | US | disclosed |
| WO-2002021218-A1 | PHASE-SHIFT MASKS AND METHODS OF FABRICATION | GRAY SCALE TECHNOLOGIES, INC. (US) | 2002-03-14 | — | — | WO | disclosed |
| US-20020028392-A1 | Phase-shift masks and methods of fabrication | GRAY SCALE TECHNOLOGIES, INC. | 2002-03-07 | — | — | US | disclosed |