SCHEMBL28835950

SCHEMBL28835950

ClC(Cl)(Cl)n1ccc(-c2ccccc2)n1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.53
KEAP1 Q14145 1/20 0.41
KDM4E B2RXH2 5/20 0.40
HSD17B10 Q99714 1/20 0.40
MEN1 O00255 5/20 0.39
ALDH1A1 P00352 5/20 0.39
SMN1; SMN2 Q16637 4/20 0.39
RAB9A P51151 4/20 0.39
TSHR P16473 1/20 0.39
GFER P55789 1/20 0.39
SCN9A Q15858 1/20 0.37
ASIC3 Q9UHC3 2/20 0.37
NPC1 O15118 2/20 0.37
HPGD P15428 3/20 0.36
ADORA2A P29274 1/20 0.36
ADORA1 P30542 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
MAPT P10636 2/20 0.36
PKM P14618 1/20 0.36
ALDH1A2 O94788 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28109887 0.82 KMT2A (0.55) KMT2AKEAP1KDM4EHSD17B10MEN1
SCHEMBL6438456 0.80 KMT2A (0.53) KMT2AKEAP1KDM4EHSD17B10MEN1
SCHEMBL4982785 0.80 KMT2A (0.53) KMT2AKEAP1KDM4EHSD17B10MEN1
SCHEMBL13045974 0.80 KMT2A (0.59) KMT2AKEAP1KDM4EHSD17B10MEN1
SCHEMBL2454577 0.80 KMT2A (0.59) KMT2AKEAP1KDM4EHSD17B10MEN1
SCHEMBL2766813 0.79 KMT2A (0.48) KMT2AKEAP1KDM4EHSD17B10MEN1
SCHEMBL28136911 0.79 CYP1A2 (0.47) KDM4EHSD17B10ALDH1A1SMN1; SMN2RAB9A
SCHEMBL5800759 0.78 KMT2A (0.52) KMT2AKEAP1KDM4EHSD17B10MEN1
SCHEMBL2766733 0.78 KMT2A (0.52) KMT2AKEAP1KDM4EHSD17B10MEN1
SCHEMBL21323197 0.77 KMT2A (0.55) KMT2AKEAP1KDM4EHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106471089-A Thermokalite producing agent, thermosetting resin composition, cured film, the manufacture method of cured film and semiconductor device 富士胶片株式会社 2017-03-01 CN disclosed
CN-106133602-A Photosensitive polymer combination, cured film, the manufacture method of cured film and semiconductor device 富士胶片株式会社 2016-11-16 CN disclosed