Cyclohexanone

Cyclohexanone

SCHEMBL28839585

O=C1CCCCC1.[N-]=[N+]=Nc1ccccc1

nearest known ligand 0.45

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTGS2 P35354 4/20 0.45
▸ TRIM24 O15164 2/20 0.41
▸ TRIM33 Q9UPN9 2/20 0.41
▸ ALDH1A1 P00352 1/20 0.41
▸ SMO Q99835 1/20 0.38
▸ CA1 P00915 1/20 0.38
▸ CA2 P00918 1/20 0.38
▸ CA5A P35218 1/20 0.38
▸ CA9 Q16790 1/20 0.38
▸ CA5B Q9Y2D0 1/20 0.38
▸ TP53 P04637 1/20 0.38
▸ CYP2D6 P10635 1/20 0.37
▸ CYP2C19 P33261 1/20 0.37
▸ MEN1 O00255 2/20 0.34
▸ KMT2A Q03164 2/20 0.34
▸ NPC1 O15118 1/20 0.34
▸ RAB9A P51151 1/20 0.34
▸ GAA P10253 1/20 0.34
▸ PSMB8 P28062 1/20 0.34
▸ CYP1A1 P04798 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclohexane SCHEMBL29035562 0.86 PTGS2 (0.49) PTGS2ALDH1A1SMOCA1CA2
SCHEMBL17289458 0.82 PTGS2 (0.47) PTGS2ALDH1A1SMOCA1CA2
Cyclohexanone SCHEMBL28353416 0.80 CA1 (0.38) PTGS2TRIM24TRIM33ALDH1A1SMO
SCHEMBL28989968 0.80 PTGS2 (0.41) PTGS2ALDH1A1SMOCA1CA2
SCHEMBL27578941 0.80 PTGS2 (0.41) PTGS2ALDH1A1SMOCA1CA2
Benzene SCHEMBL28456073 0.79 PTGS2 (0.48) PTGS2ALDH1A1SMOCA1CA2
SCHEMBL13475909 0.79 — —
Formaldehyde SCHEMBL27489743 0.78 CA1 (0.47) PTGS2ALDH1A1SMOCA1CA2
Phosphine SCHEMBL29065184 0.77 PTGS2 (0.47) PTGS2ALDH1A1SMOCA1CA2
Fluoride SCHEMBL27800819 0.77 PTGS2 (0.47) PTGS2ALDH1A1SMOCA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115785455-B Polyphosphate film-forming resin and photoresist composition 广东粤港澳大湾区黄埔材料研究院 2023-10-10 — — CN claimed
CN-116075201-A Preparation method of patterned hole semiconductor layer and photoelectric device 宁波杭州湾新材料研究院 2023-05-05 — — CN claimed
CN-118063928-A Composite resin composition, method for producing same, insulating resin composite, and electric power device using same 株式会社日立制作所 2024-05-24 — — CN disclosed
CN-117716291-A Photosensitive conductive paste, method for producing base material with conductive pattern, method for producing electronic component, cured film, fired body, and electronic component 东丽株式会社 2024-03-15 — — CN disclosed
CN-117678039-A Electrode composition for electrospray 阿莫绿色技术有限公司 2024-03-08 — — CN disclosed
CN-115785455-B Polyphosphate film-forming resin and photoresist composition 广东粤港澳大湾区黄埔材料研究院 2023-10-10 — — CN disclosed
CN-116157262-A Oxygen-blocking cycloolefin resin cured product RIMTEC株式会社 2023-05-23 — — CN disclosed
CN-116137900-A Photosensitive conductive paste, cured product, fired body, electronic component, method for producing insulating ceramic layer with circuit pattern, method for producing electronic component, method for producing substrate with circuit pattern, and method for producing inductor 东丽株式会社 2023-05-19 — — CN disclosed
CN-116075201-A Preparation method of patterned hole semiconductor layer and photoelectric device 宁波杭州湾新材料研究院 2023-05-05 — — CN disclosed
CN-108292630-B Ferroelectric memory element, method for manufacturing the same, memory cell using the same, and wireless communication device using the same 东丽株式会社 2023-04-25 — — CN disclosed
CN-110383538-B Thin film electrode, resin layer forming ink, inorganic layer forming ink, and electrode printing apparatus 株式会社理光 2022-08-16 — — CN disclosed
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