SCHEMBL2884185

SCHEMBL2884185

C=CC(=O)OC(C)C1COC1

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.37
HCAR2 Q8TDS4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9736427 0.84 TSHR (0.42) TSHRHCAR2
SCHEMBL9033896 0.84 TSHR (0.42) TSHRHCAR2
SCHEMBL28044346 0.82 TSHR (0.41) TSHRHCAR2
SCHEMBL22129735 0.81 TSHR (0.39) TSHRHCAR2
SCHEMBL1774088 0.79 TSHR (0.38) TSHRHCAR2
SCHEMBL10870459 0.79 TSHR (0.38) TSHR
SCHEMBL1504293 0.79 TSHR (0.38) TSHR
SCHEMBL28020538 0.78 TSHR (0.37) TSHRHCAR2
Ethylene SCHEMBL27409771 0.78 TSHR (0.37) TSHR
SCHEMBL22230402 0.76 TSHR (0.36) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115380432-B Porous film, separator for secondary battery, and secondary battery 东丽株式会社 2024-07-16 CN disclosed
CN-115380434-B Porous film, separator for secondary battery, and secondary battery 东丽株式会社 2024-05-31 CN disclosed
CN-118104060-A Slurry composition for functional layer of nonaqueous secondary battery, separator for nonaqueous secondary battery, and nonaqueous secondary battery 日本瑞翁株式会社 2024-05-28 CN disclosed
CN-115516703-B Porous film, separator for secondary battery, and secondary battery 东丽株式会社 2024-04-19 CN disclosed
CN-117677901-A Positive photosensitive resin composition 日产化学株式会社 2024-03-08 CN disclosed
CN-112969578-B Porous film, separator for secondary battery, and secondary battery 东丽株式会社 2024-02-09 CN disclosed
CN-113039069-B Porous film, separator for secondary battery, and secondary battery 东丽株式会社 2023-12-05 CN disclosed
CN-111324013-B Chemically amplified positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-12-01 CN disclosed
CN-111132963-B Compound, composition, cured product, and method for producing cured product 株式会社艾迪科 2023-11-24 CN disclosed
CN-117120928-A Photosensitive colored resin composition, cured product, partition wall, organic electroluminescent element, image display device, and compound 三菱化学株式会社 2023-11-24 CN disclosed
CN-102382505-B Ink composition for forming pattern, light guide plate, light emitting unit, and liquid crystal display module having the light emitting unit CHI MEI IND CO LTD 2014-12-10 CN disclosed
EP-2088175-B1 Ink composition, inkjet recording method, and printed article FUJIFILM CORP (JP) 2014-10-15 EP disclosed
CN-102566273-B Positive photosensitive resin composition and method for forming pattern CHI MEI CORP 2014-05-07 CN disclosed
US-8299142-B2 Ink composition, inkjet recording method, and printed article FUJIFILM CORPORATION (JP) 2012-10-30 US disclosed
CN-102566273-A Positive photosensitive resin composition and method for forming pattern QIMEI IND CO LTD 2012-07-11 CN disclosed
CN-102382505-A Ink composition for forming pattern, light guide plate, light emitting unit, and liquid crystal display module having the light emitting unit CHI MEI IND CO LTD 2012-03-21 CN disclosed
US-7759451-B2 Fumaric diester copolymer TOSOH CORPORATION (JP) 2010-07-20 US disclosed
EP-2088175-A1 Ink composition, inkjet recording method, and printed article FUJIFILM Corporation (JP) 2009-08-12 EP disclosed
US-20090197055-A1 Ink composition, inkjet recording method, and printed article FUJIFILM CORPORATION (JP) 2009-08-06 US disclosed
US-20070298247-A1 Fumaric diester copolymer TOSOH CORPORATION (JP) 2007-12-27 US disclosed