⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28857091 | 0.90 | — | — | |
| SCHEMBL28955039 | 0.82 | — | — | |
| SCHEMBL5066933 | 0.76 | — | — | |
| SCHEMBL28857203 | 0.76 | — | — | |
| SCHEMBL28857127 | 0.75 | GSTP1 (0.31) | — | |
| SCHEMBL28857130 | 0.75 | GSTP1 (0.31) | — | |
| SCHEMBL28857132 | 0.73 | HCAR2 (0.35) | — | |
| SCHEMBL28857128 | 0.73 | HCAR2 (0.35) | — | |
| SCHEMBL29130282 | 0.71 | — | — | |
| SCHEMBL15092937 | 0.66 | HIF1A (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115151868-A | Photosensitive resin composition, method for sorting photosensitive resin composition, method for producing patterned cured film, and method for producing semiconductor device | 昭和电工材料株式会社 | 2022-10-04 | — | — | CN | disclosed |