Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13005842 | 0.89 | NPSR1 (0.49) | NPSR1TSHREPHX2ALDH1A1MEN1 | |
| SCHEMBL1397825 | 0.82 | NPSR1 (0.47) | NPSR1TSHREPHX2ALDH1A1MEN1 | |
| SCHEMBL4806381 | 0.82 | TSHR (0.42) | NPSR1TSHREPHX2 | |
| SCHEMBL10069432 | 0.81 | NPSR1 (0.40) | NPSR1TSHREPHX2ALDH1A1MEN1 | |
| SCHEMBL23933250 | 0.81 | NPSR1 (0.46) | NPSR1TSHREPHX2ALDH1A1MEN1 | |
| SCHEMBL23933284 | 0.81 | NPSR1 (0.46) | NPSR1TSHREPHX2ALDH1A1MEN1 | |
| SCHEMBL23933249 | 0.81 | NPSR1 (0.46) | NPSR1TSHREPHX2ALDH1A1MEN1 | |
| SCHEMBL1397649 | 0.80 | NPSR1 (0.46) | NPSR1TSHREPHX2ALDH1A1 | |
| SCHEMBL4340777 | 0.79 | NPSR1 (0.47) | NPSR1TSHREPHX2ALDH1A1MEN1 | |
| SCHEMBL4567260 | 0.76 | TSHR (0.46) | NPSR1TSHREPHX2ALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9128373-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-08 | — | — | US | disclosed |
| US-9128373-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-08 | — | — | US | disclosed |
| US-8440666-B2 | Pyridazinone compounds and P2X7 receptor inhibitors | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-05-14 | — | — | US | disclosed |
| US-8440666-B2 | Pyridazinone compounds and P2X7 receptor inhibitors | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-05-14 | — | — | US | disclosed |
| US-8440666-B2 | Pyridazinone compounds and P2X7 receptor inhibitors | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-05-14 | — | — | US | disclosed |
| US-20120258405-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-11 | — | — | US | disclosed |
| US-20120258405-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-11 | — | — | US | disclosed |
| US-20120219912-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219912-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20100286390-A1 | PYRIDAZINONE COMPOUNDS AND P2X7 RECEPTOR INHIBITORS | NISSAN CHEMICAL INDUSTRIES LIMITED | 2010-11-11 | — | — | US | disclosed |
| US-20100286390-A1 | PYRIDAZINONE COMPOUNDS AND P2X7 RECEPTOR INHIBITORS | NISSAN CHEMICAL INDUSTRIES LIMITED | 2010-11-11 | — | — | US | disclosed |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | IDEMITSU KOSAN CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | IDEMITSU KOSAN CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| WO-2009057827-A1 | PYRIDAZINONE DERIVATIVES AND USE THEREOF AS P2X7 RECEPTOR INHIBITORS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-07 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100286390-A1 | PYRIDAZINONE COMPOUNDS AND P2X7 RECEPTOR INHIBITORS | P2RY1, P2RX7, P2RX1 | NPSR1 202/4885TSHR 989/4885EPHX2 2169/4885 |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | C1S, CCNL2, CCNT1 | NPSR1 706/4885TSHR 3138/4885EPHX2 2832/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.