Methacrylic Acid

Methacrylic Acid

SCHEMBL28890922

C=C(C)C(=O)O.C=C(C)C(=O)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)CC(F)(F)F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL434897 0.96 TSHR (0.32)
SCHEMBL28267229 0.96 TSHR (0.32)
SCHEMBL2328352 0.94 TSHR (0.31)
SCHEMBL28546848 0.94 TSHR (0.31)
SCHEMBL4669207 0.94 TSHR (0.31)
SCHEMBL28552395 0.94 TSHR (0.31)
SCHEMBL28317988 0.90 ALDH1A1 (0.41)
SCHEMBL28221198 0.90
SCHEMBL31298528 0.88 TSHR (0.33)
Glycerin SCHEMBL28088489 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110231755-B Photoresist composition, pixel defining layer, preparation method and application thereof 京东方科技集团股份有限公司 2020-06-19 CN disclosed