SCHEMBL28906270

SCHEMBL28906270

Sc1ccccc1Oc1ccccc1-c1ccsc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 3/20 0.44
ADRA2B P18089 3/20 0.44
ADRA2C P18825 3/20 0.44
ADRA1D P25100 1/20 0.43
ADRA1A P35348 1/20 0.43
ADRA1B P35368 1/20 0.43
CYP2A6 P11509 2/20 0.41
CYP2B6 P20813 2/20 0.41
CYP2E1 P05181 1/20 0.41
PTPRC P08575 1/20 0.41
FYN P06241 1/20 0.37
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
MAOB P27338 1/20 0.35
STK10 O94804 2/20 0.34
SLK Q9H2G2 2/20 0.34
GPR84 Q9NQS5 1/20 0.33
TMIGD3 P0DMS9 1/20 0.33
ADORA2A P29274 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20338620 0.80 CYP2A6 (0.52) ADRA2AADRA2BADRA2CADRA1DADRA1A
SCHEMBL17641740 0.79 NCOA1 (0.50) ADRA2AADRA2BADRA2CADRA1DADRA1A
SCHEMBL28305471 0.78 CYP2A6 (0.50) ADRA2AADRA2BADRA2CADRA1DADRA1A
Fluoride SCHEMBL27959728 0.77 CYP2A6 (0.48) ADRA2AADRA2BADRA2CADRA1DADRA1A
SCHEMBL30340102 0.75 FYN (0.56) ADRA2AADRA2BADRA2CADRA1DADRA1A
SCHEMBL28415598 0.75 CYP2E1 (0.33) CYP2A6CYP2B6CYP2E1TDO2
SCHEMBL4454628 0.75 FYN (0.56) ADRA2AADRA2BADRA2CADRA1DADRA1A
SCHEMBL4946960 0.73 CYP2A6 (0.64) ADRA2AADRA2BADRA2CADRA1DADRA1A
SCHEMBL31037154 0.73 CA1 (0.38) ADRA2B
SCHEMBL9820616 0.73 CA1 (0.38) ADRA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111217946-B Composition comprising a compound containing a vinyl group 东京应化工业株式会社 2022-12-06 CN disclosed