⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL289066 | 1.00 | — | — | |
| SCHEMBL28672055 | 0.98 | — | — | |
| SCHEMBL6864200 | 0.98 | — | — | |
| SCHEMBL29757015 | 0.98 | — | — | |
| SCHEMBL30252312 | 0.98 | — | — | |
| SCHEMBL1054680 | 0.93 | — | — | |
| SCHEMBL30053457 | 0.92 | — | — | |
| SCHEMBL28930716 | 0.92 | — | — | |
| SCHEMBL28930477 | 0.90 | — | — | |
| SCHEMBL446703 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2427468-B2 | PREPARATION OF A METAL COMPLEX | JOHNSON MATTHEY PLC (GB) | 2025-06-04 | — | — | EP | disclosed |
| US-12275727-B2 | Compound containing structure of a five-membered heteroaromatic ring, pharmaceutical compositions thereof and applications thereof | 280 BIO, INC. (US) | 2025-04-15 | — | — | US | disclosed |
| EP-4488275-A1 | COMPOUND CONTAINING FIVE-MEMBERED HETEROAROMATIC RING STRUCTURE, AND PHARMACEUTICAL COMPOSITION AND USE THEREOF | Shanghai Yingli Pharmaceutical Co., Ltd (CN) | 2025-01-08 | — | — | EP | disclosed |
| US-20230278998-A1 | Compound containing structure of a five-membered heteroaromatic ring, pharmaceutical compositions thereof and applications thereof | 280 BIO, INC. (US) | 2023-09-07 | — | — | US | disclosed |
| WO-2023088375-A1 | β-LACTAMASE INHIBITOR INTERMEDIATE AND PREPARATION METHOD THEREFOR | 苏州信诺维医药科技股份有限公司 | 2023-05-25 | — | — | WO | disclosed |
| EP-3141538-B1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | VERSUM MAT US LLC (US) | 2019-10-30 | — | — | EP | disclosed |
| EP-2318477-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-06-05 | — | — | EP | disclosed |
| EP-2427468-B1 | PREPARATION OF A METAL COMPLEX | JOHNSON MATTHEY PLC (GB) | 2017-06-14 | — | — | EP | disclosed |
| EP-3141538-A1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-03-15 | — | — | EP | disclosed |
| EP-2141141-B1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PROD & CHEM (US) | 2016-09-28 | — | — | EP | disclosed |
| WO-2010005937-A1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-01-14 | — | — | WO | disclosed |
| EP-2141141-A1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | Air Products and Chemicals, Inc. (US) | 2010-01-06 | — | — | EP | disclosed |
| US-20090297711-A1 | Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090291210-A1 | Additives to Prevent Degradation of Cyclic Alkene Derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-11-26 | — | — | US | disclosed |
| EP-1931613-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| EP-1931746-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| WO-2007033075-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| WO-2007033123-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070057234-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |