SCHEMBL6864200

SCHEMBL6864200

CO/C1=C\C=C/CCCCCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL289066 0.98
SCHEMBL289067 0.98
SCHEMBL29757015 0.96
SCHEMBL30252312 0.96
SCHEMBL28672055 0.96
SCHEMBL28930477 0.92
SCHEMBL1054680 0.91
SCHEMBL30053457 0.90
SCHEMBL28930716 0.90
SCHEMBL15128916 0.85

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6808865-B1 INK FOR PRINTED CIRCUITS SCREEN PRINTING STENCIL; WATER AND SOLVENT RESISTANT; POLYMER OF POLYVINYL ALCOHOL AND AN N-ALKYLOLACRYLAMIDE, AN ETHYLENICALLY UNSATURATED PHOTOREACTIVE MONOMER, PHOTOPOLYMERIZATION INITIATOR, AND AN EPOXY COMPOUND GOO CHEMICAL CO., LTD. (JP) 2004-10-26 US disclosed
EP-1213327-A1 PHOTOSENSITIVE RESIN COMPOSITION OF AQUEOUS EMULSION TYPE Goo Chemical Co., Ltd. (JP) 2002-06-12 EP disclosed