⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2897982 | 0.80 | — | — | |
| SCHEMBL612639 | 0.77 | — | — | |
| SCHEMBL19125101 | 0.74 | — | — | |
| SCHEMBL3689272 | 0.74 | SHBG (0.38) | — | |
| SCHEMBL1472200 | 0.73 | — | — | |
| SCHEMBL13269515 | 0.72 | SHBG (0.41) | — | |
| SCHEMBL302215 | 0.72 | SHBG (0.41) | — | |
| SCHEMBL3741838 | 0.71 | PPM1B (0.31) | — | |
| SCHEMBL12098222 | 0.71 | — | — | |
| SCHEMBL9231103 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250154325-A1 | VANILLIC ACID-BASED ORGANIC-INORGANIC COMPOUND, CURABLE COMPOSITION, AND PRODUCTION METHOD THEREOF | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE (KR) | 2025-05-15 | — | — | US | claimed |
| US-20230391956-A1 | SILYL ETHER ISOHEXIDE-BASED ORGANIC-INORGANIC COMPOUND, METHOD FOR PREPARING THE SAME, AND CURABLE COMPOSITION CONTAINING THE SAME | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE (KR) | 2023-12-07 | — | — | US | claimed |
| US-10858539-B2 | Siloxane hard-coating resin composition | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2020-12-08 | — | — | US | claimed |
| US-20180215949-A1 | SILOXANE HARD-COATING RESIN COMPOSITION | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2018-08-02 | — | — | US | claimed |
| US-20250154325-A1 | VANILLIC ACID-BASED ORGANIC-INORGANIC COMPOUND, CURABLE COMPOSITION, AND PRODUCTION METHOD THEREOF | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE (KR) | 2025-05-15 | — | — | US | disclosed |
| US-20230391956-A1 | SILYL ETHER ISOHEXIDE-BASED ORGANIC-INORGANIC COMPOUND, METHOD FOR PREPARING THE SAME, AND CURABLE COMPOSITION CONTAINING THE SAME | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE (KR) | 2023-12-07 | — | — | US | disclosed |
| US-10858539-B2 | Siloxane hard-coating resin composition | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2020-12-08 | — | — | US | disclosed |
| US-20180215949-A1 | SILOXANE HARD-COATING RESIN COMPOSITION | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2018-08-02 | — | — | US | disclosed |
| US-7695781-B2 | Antireflective film, polarizing plate including the same, image display unit including the same and method for producing antireflective film | FUJIFILM CORPORATION (JP) | 2010-04-13 | — | — | US | disclosed |
| US-20050181146-A1 | Antireflective film, polarizing plate including the same, image display unit including the same and method for producing antireflective film | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-18 | — | — | US | disclosed |