Ethylene

Ethylene

SCHEMBL2895477

C=C.CCCCCCCCCCCCc1ccccc1Oc1ccccc1CCCCCCCCCCCC

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
THRA P10827 1/20 0.59
THRB P10828 1/20 0.59
LIPG Q9Y5X9 1/20 0.53
ALOX5 P09917 1/20 0.51
PTGS2 P35354 1/20 0.51
PPARA Q07869 2/20 0.49
PPARG P37231 1/20 0.47
NR1H2 P55055 1/20 0.44
NR1H3 Q13133 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL4621010 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
Ethylene SCHEMBL2174988 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
Ethylene SCHEMBL1896180 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
Ethylene SCHEMBL27286570 0.98 THRA (0.57) THRATHRBLIPGALOX5PTGS2
Ethylene SCHEMBL28876798 0.98 THRA (0.57) THRATHRBLIPGALOX5PTGS2
Ethylene SCHEMBL28146010 0.98 THRA (0.57) THRATHRBLIPGALOX5PTGS2
SCHEMBL173283 0.96 THRA (0.58) THRATHRBLIPGALOX5PTGS2
SCHEMBL145217 0.96 THRA (0.58) THRATHRBLIPGALOX5PTGS2
SCHEMBL93801 0.96 THRA (0.58) THRATHRBLIPGALOX5PTGS2
SCHEMBL8444310 0.96 THRA (0.58) THRATHRBLIPGALOX5PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230205106-A1 TONER FOR DEVELOPING ELECTROSTATIC LATENT IMAGE AND PRODUCTION METHOD THEREOF RICOH COMPANY, LTD. (JP) 2023-06-29 US disclosed
CN-110100193-A wavelength conversion film and backlight unit 富士胶片株式会社 2019-08-06 CN disclosed
CN-109789720-A Transfer film and image forming method 富士胶片株式会社 2019-05-21 CN disclosed
CN-105073941-B Composition for polishing and abrasive material manufacture method 福吉米株式会社 2018-01-30 CN disclosed
CN-105378004-B Ink group, ink jet recording method and tingle body 日本化药株式会社 2017-07-04 CN disclosed
CN-106317777-A Resin composition 味之素株式会社 2017-01-11 CN disclosed
EP-2817342-A1 POLYMERIZATION OF COMPOSITIONS COMPRISING A FARNESENE Amyris, Inc. (US) 2014-12-31 EP disclosed
WO-2013126129-A1 POLYMERIZATION OF COMPOSITIONS COMPRISING A FARNESENE Amyris, Inc. (US) 2013-08-29 WO disclosed
EP-2248861-B1 Ink composition for ink jet recording SEIKO EPSON CORP (JP) 2013-03-27 EP disclosed
US-20100285221-A1 INK COMPOSITION FOR INK JET RECORDING SEIKO EPSON CORPORATION 2010-11-11 US disclosed
EP-2248861-A1 Ink composition for ink jet recording Seiko Epson Corporation (JP) 2010-11-10 EP disclosed