⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2665497 | 0.81 | HSD11B1 (0.30) | — | |
| SCHEMBL812575 | 0.78 | — | — | |
| SCHEMBL18404538 | 0.75 | — | — | |
| SCHEMBL27925099 | 0.75 | — | — | |
| SCHEMBL27638105 | 0.75 | — | — | |
| SCHEMBL6176494 | 0.73 | — | — | |
| SCHEMBL6369664 | 0.72 | — | — | |
| SCHEMBL14221890 | 0.72 | — | — | |
| SCHEMBL20372943 | 0.71 | — | — | |
| SCHEMBL16992923 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118625601-A | Hard mask composition, hard mask layer and method of forming pattern | 三星SDI株式会社 | 2024-09-10 | — | — | CN | disclosed |
| CN-112194780-B | Polymer, hard mask composition and method for forming pattern | 厦门恒坤新材料科技股份有限公司 | 2023-05-05 | — | — | CN | disclosed |