Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RPS6KA3 | P51812 | 2/20 | 0.50 |
| ▸ | ABL1 | P00519 | 1/20 | 0.47 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.47 |
| ▸ | BCR | P11274 | 1/20 | 0.47 |
| ▸ | MGAM | O43451 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | SI | P14410 | 1/20 | 0.46 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 11/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.46 |
| ▸ | KIF11 | P52732 | 1/20 | 0.41 |
| ▸ | USP7 | Q93009 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25420748 | 0.85 | RPS6KA3 (0.49) | RPS6KA3ABL1ABCB1BCRESR1 | |
| SCHEMBL27928527 | 0.81 | ESR1 (0.57) | RPS6KA3ABL1ABCB1BCRESR1 | |
| SCHEMBL16982131 | 0.81 | RPS6KA3 (0.49) | RPS6KA3ABL1ABCB1BCRESR1 | |
| SCHEMBL1760086 | 0.77 | ESR1 (0.53) | RPS6KA3ABL1ABCB1BCRESR1 | |
| SCHEMBL13104729 | 0.75 | ESR1 (0.67) | RPS6KA3ABL1ABCB1BCRESR1 | |
| SCHEMBL28226426 | 0.73 | ESR1 (0.70) | ESR1ESR2 | |
| SCHEMBL38659424 | 0.73 | ESR1 (0.70) | ESR1ESR2 | |
| SCHEMBL410730 | 0.73 | ABL1 (0.56) | ABL1ABCB1BCRESR1ESR2 | |
| SCHEMBL1759486 | 0.72 | ESR1 (0.46) | RPS6KA3ABL1ABCB1BCRESR1 | |
| SCHEMBL29006472 | 0.72 | SENP1 (0.48) | RPS6KA3MGAMGAASIMGAM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116157382-A | Material for metal patterning, amine compound, electronic device, and method for forming metal pattern | 东曹株式会社 | 2023-05-23 | — | — | CN | disclosed |