SCHEMBL29008375

SCHEMBL29008375

FCF.O=C(O)c1ccc(-c2ccccc2)cc1C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ACMSD Q8TDX5 4/20 0.61
HNF4A P41235 2/20 0.61
DHFR P00374 1/20 0.61
MCL1 Q07820 1/20 0.61
DCLRE1B Q9H816 2/20 0.59
DCLRE1A Q6PJP8 1/20 0.59
CDC25B P30305 1/20 0.52
ATM Q13315 1/20 0.52
PTPN1 P18031 3/20 0.51
AKR1C2 P52895 2/20 0.51
AKR1C1 Q04828 2/20 0.51
PTPN2 P17706 1/20 0.50
PTPN6 P29350 1/20 0.50
IKBKB O14920 1/20 0.49
ALDH1A1 P00352 1/20 0.48
ALOX15 P16050 1/20 0.48
ACLY P53396 4/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL68982 0.92 ACMSD (0.70) ACMSDHNF4ADHFRMCL1DCLRE1B
SCHEMBL30616786 0.92 ACMSD (0.70) ACMSDHNF4ADHFRMCL1DCLRE1B
Methane SCHEMBL29008389 0.90 ACMSD (0.68) ACMSDHNF4ADHFRMCL1DCLRE1B
Water SCHEMBL29008379 0.90 ACMSD (0.68) ACMSDHNF4ADHFRMCL1DCLRE1B
Hydrochloric Acid SCHEMBL11162468 0.90 ACMSD (0.68) ACMSDHNF4ADHFRMCL1DCLRE1B
Formaldehyde SCHEMBL29008382 0.88 ACMSD (0.66) ACMSDHNF4ADHFRMCL1DCLRE1B
SCHEMBL28279304 0.88 ACMSD (0.67) ACMSDHNF4ADHFRMCL1DCLRE1B
SCHEMBL30365332 0.88 ACMSD (0.67) ACMSDHNF4ADHFRMCL1DCLRE1B
Sulfur Dioxide SCHEMBL29008373 0.86 ACMSD (0.63) ACMSDHNF4ADHFRMCL1DCLRE1B
Benzene SCHEMBL3623695 0.85 KMT2A (0.60) ACMSDHNF4ADHFRMCL1DCLRE1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116194435-A Fluorine-containing diamine or salt thereof, method for producing fluorine-containing diamine or salt thereof, polyamide, method for producing polyamide, polyamide solution, polyamide cyclized body, method for producing polyamide cyclized body, insulating material for high-frequency electronic component, method for producing insulating material for high-frequency electronic component, high-frequency machine, and insulating material for producing high-frequency electronic component 中央硝子株式会社 2023-05-30 CN disclosed
CN-116075424-A Polybenzoxazole, polyamide solution, insulating material for high-frequency electronic parts, high-frequency device, insulating material for high-frequency electronic parts production, process for producing polyamide, process for producing polybenzoxazole, process for producing insulating material for high-frequency electronic parts, and diamine or salt thereof 中央硝子株式会社 2023-05-05 CN disclosed