Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPAR1 | Q92633 | 1/20 | 0.57 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.57 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.57 |
| ▸ | FAAH | O00519 | 2/20 | 0.56 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.56 |
| ▸ | MEN1 | O00255 | 1/20 | 0.54 |
| ▸ | THRB | P10828 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL755636 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL9751433 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL44028 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL5364867 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL1070643 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL24398977 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL11576564 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL21924992 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL20774497 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 | |
| SCHEMBL4448701 | 1.00 | LPAR1 (0.57) | LPAR1LPAR2LPAR3FAAHTRPV1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240018286-A1 | FINE RESIN PARTICLE AND APPLICATION THEREOF | SEKISUI KASEI CO., LTD. (JP) | 2024-01-18 | — | — | US | disclosed |
| EP-4265658-A1 | RESIN FINE PARTICLES AND APPLICATION THEREOF | Sekisui Kasei Co., Ltd. (JP) | 2023-10-25 | — | — | EP | disclosed |
| CN-115836052-A | Topical formulations of (1S) -1-phenyl-2-pyridin-2-ylethylamine | 拜尔哈文制药股份有限公司 | 2023-03-21 | — | — | CN | disclosed |
| EP-3443951-B1 | SUPERFATTING AGENT AND PERSONAL CARE COMPOSITION | SABO SPA (IT) | 2022-09-21 | — | — | EP | disclosed |
| EP-3613720-B1 | WATER ABSORPTION PREVENTING MATERIAL FOR INORGANIC POROUS MATERIAL, METHOD FOR MODIFYING CONCRETE, AND CONCRETE | DOW TORAY CO LTD (JP) | 2022-08-03 | — | — | EP | disclosed |
| WO-2022131052-A1 | RESIN FINE PARTICLES AND APPLICATION THEREOF | 積水化成品工業株式会社 | 2022-06-23 | — | — | WO | disclosed |
| US-11351110-B2 | Silicone-free cosmetic compositions | Thomas, Kirsten Elizabeth (US) | 2022-06-07 | — | — | US | disclosed |
| US-20220125935-A1 | COMPOSITION FOR PREVENTING OR TREATING ATOPIC DERMATITIS COMPRISING SKIN-PENETRATING NUCLEIC ACID COMPLEX AS EFFECTIVE COMPONENT | SEASUN THERAPEUTICS (KR) | 2022-04-28 | — | — | US | disclosed |
| US-9777251-B2 | Liquid composition for removing titanium nitride, semiconductor-element cleaning method using same, and semiconductor-element manufacturing method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-20160281038-A1 | LIQUID COMPOSITION FOR REMOVING TITANIUM NITRIDE, SEMICONDUCTOR-ELEMENT CLEANING METHOD USING SAME, AND SEMICONDUCTOR-ELEMENT MANUFACTURING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-09-29 | — | — | US | disclosed |
| EP-1342777-B9 | Substrate cleaning liquid media and cleaning method | MITSUBISHI CHEM CORP (JP) | 2010-02-17 | — | — | EP | disclosed |
| EP-1342777-B1 | Substrate cleaning liquid media and cleaning method | MITSUBISHI CHEM CORP (JP) | 2009-08-19 | — | — | EP | disclosed |
| EP-1811949-A1 | TOPICAL SLIMMING PREPARATION AND A COSMETIC CONTAINING A CARNITINE DERIVATIVE | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-08-01 | — | — | EP | disclosed |
| US-7235516-B2 | For use in semiconductor devices, display devices; for efficiently removing contaminant particles (fine particles) present on a substrate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20070135322-A1 | SUBSTRATE SURFACE CLEANING LIQUID MEDIUM AND CLEANING METHOD | MITSUBISHI CHEMICAL CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| WO-2005115326-A1 | TOPICAL SLIMMING PREPARATION AND A COSMETIC CONTAINING A CARNITINE DERIVATIVE | SHOWA DENKO K.K. (JP) | 2005-12-08 | — | — | WO | disclosed |
| EP-1342777-A1 | Substrate cleaning liquid media and cleaning method | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030144163-A1 | Substrate surface cleaning liquid mediums and cleaning method | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-07-31 | — | — | US | disclosed |
| US-4485091-A | HYDROGEN PEROXIDE, OIL IN WATER EMULSION | QUINODERM LIMITED (GB) | 1984-11-27 | — | — | US | disclosed |