SCHEMBL29017102

SCHEMBL29017102

CCc1cc([N+](=O)[O-])c(O)cc1C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SNCA P37840 2/20 0.47
GPR35 Q9HC97 5/20 0.46
ALOX15 P16050 3/20 0.45
ALOX12 P18054 2/20 0.45
ALDH1A1 P00352 3/20 0.44
MAPK1 P28482 3/20 0.43
TSHR P16473 3/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
HPGD P15428 2/20 0.43
TP53 P04637 1/20 0.43
HSD17B10 Q99714 2/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
PDK1 Q15118 1/20 0.40
ALDH5A1 P51649 1/20 0.40
ABAT P80404 1/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
MEN1 O00255 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11267280 0.84 CYP1A2 (0.47) SNCAGPR35ALDH1A1TSHRSMN1; SMN2
SCHEMBL12396038 0.82 TSHR (0.46) GPR35ALDH1A1TSHRSMN1; SMN2HSD17B10
SCHEMBL62337 0.82 GPR35 (0.54) SNCAGPR35ALOX15ALOX12ALDH1A1
SCHEMBL29664349 0.80 GPR35 (0.52) SNCAGPR35ALOX15ALOX12ALDH1A1
SCHEMBL8580180 0.80 GPR35 (0.52) SNCAGPR35ALOX15ALOX12ALDH1A1
SCHEMBL310541 0.80 SNCA (0.46) SNCAGPR35ALOX15ALOX12ALDH1A1
SCHEMBL7027831 0.79 GPR35 (0.50) SNCAGPR35ALOX15ALOX12ALDH1A1
SCHEMBL14658802 0.78 CYP1A2 (0.46) GPR35ALDH1A1MAPK1TSHRSMN1; SMN2
SCHEMBL2554501 0.78 TSHR (0.50) ALOX15ALDH1A1TSHRL3MBTL1MEN1
SCHEMBL28405537 0.77 SNCA (0.43) SNCAGPR35ALOX15ALOX12ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116075424-A Polybenzoxazole, polyamide solution, insulating material for high-frequency electronic parts, high-frequency device, insulating material for high-frequency electronic parts production, process for producing polyamide, process for producing polybenzoxazole, process for producing insulating material for high-frequency electronic parts, and diamine or salt thereof 中央硝子株式会社 2023-05-05 CN disclosed