Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trolamine SCHEMBL5144437 | 1.00 | MAPT (0.41) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL29180603 | 1.00 | MAPT (0.41) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL5943568 | 0.96 | MAPT (0.44) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL7554336 | 0.96 | MAPT (0.44) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL565435 | 0.96 | MAPT (0.44) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL923682 | 0.96 | MAPT (0.44) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL5862137 | 0.96 | MAPT (0.44) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL8059260 | 0.92 | MAPT (0.41) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL6711907 | 0.92 | MAPT (0.41) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 | |
| Trolamine SCHEMBL27988073 | 0.92 | MAPT (0.41) | MAPTKDM4EALOX15SMN1; SMN2CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118743002-A | Composition for selectively etching silicon-germanium material, use for selectively etching silicon-germanium material and method for selectively etching silicon-germanium material | 巴斯夫欧洲公司 | 2024-10-01 | — | — | CN | claimed |
| CN-118743001-A | Composition for selectively etching silicon-germanium material, use for selectively etching silicon-germanium material and method for selectively etching silicon-germanium material | 巴斯夫欧洲公司 | 2024-10-01 | — | — | CN | claimed |
| CN-117946686-A | Composition for selectively etching aluminum oxide | 安集微电子科技（上海）股份有限公司 | 2024-04-30 | — | — | CN | claimed |
| CN-116355614-A | Etching composition | 安集微电子科技（上海）股份有限公司 | 2023-06-30 | — | — | CN | claimed |
| CN-116195036-A | Composition for selectively etching silicon-germanium material, use thereof and method | 巴斯夫欧洲公司 | 2023-05-30 | — | — | CN | claimed |
| CN-119615164-A | High-selectivity SiO (silicon dioxide) without damaging Cu and Ta barrier layers2Etching solution | 湖北兴福电子材料股份有限公司 | 2025-03-14 | — | — | CN | disclosed |
| CN-118743002-A | Composition for selectively etching silicon-germanium material, use for selectively etching silicon-germanium material and method for selectively etching silicon-germanium material | 巴斯夫欧洲公司 | 2024-10-01 | — | — | CN | disclosed |
| CN-118743001-A | Composition for selectively etching silicon-germanium material, use for selectively etching silicon-germanium material and method for selectively etching silicon-germanium material | 巴斯夫欧洲公司 | 2024-10-01 | — | — | CN | disclosed |
| CN-117946686-A | Composition for selectively etching aluminum oxide | 安集微电子科技（上海）股份有限公司 | 2024-04-30 | — | — | CN | disclosed |