Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trolamine SCHEMBL5943568 | 1.00 | MAPT (0.44) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| Trolamine SCHEMBL7554336 | 1.00 | MAPT (0.44) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| Trolamine SCHEMBL5144437 | 0.96 | MAPT (0.41) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| Trolamine SCHEMBL29180603 | 0.96 | MAPT (0.41) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| Trolamine SCHEMBL29028255 | 0.96 | MAPT (0.41) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| Trolamine SCHEMBL4748243 | 0.95 | MAPT (0.47) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| Trolamine SCHEMBL1146 | 0.95 | MAPT (0.47) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| Trolamine SCHEMBL434089 | 0.95 | MAPT (0.47) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| Trolamine SCHEMBL15845959 | 0.95 | MAPT (0.47) | MAPTKDM4ESMN1; SMN2ALOX15HPGD | |
| SCHEMBL23528233 | 0.91 | MAPT (0.46) | MAPTKDM4ESMN1; SMN2ALOX15HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 225 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260042978-A1 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2026-02-12 | — | — | US | claimed |
| CN-119615164-A | High-selectivity SiO (silicon dioxide) without damaging Cu and Ta barrier layers2Etching solution | 湖北兴福电子材料股份有限公司 | 2025-03-14 | — | — | CN | claimed |
| US-11970647-B2 | Composition, its use and a process for selectively etching silicon-germanium material | BASF SE (DE) | 2024-04-30 | — | — | US | claimed |
| WO-2024083020-A1 | COMPOSITION FOR SELECTIVELY ETCHING ALUMINUM OXIDE | 安集微电子科技（上海）股份有限公司 | 2024-04-25 | — | — | WO | claimed |
| US-20240093089-A1 | COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING A LAYER COMPRISING AN ALUMINIUM COMPOUND IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER AND/OR COBALT | BASF SE (DE) | 2024-03-21 | — | — | US | claimed |
| CN-117620519-A | Soldering flux for laser soldering tin wire and preparation method thereof | 广州汉源微电子封装材料有限公司 | 2024-03-01 | — | — | CN | claimed |
| US-20230326759-A1 | Composition, Its Use And A Process For Selectively Etching Silicon-Germanium Material | BASF SE (DE) | 2023-10-12 | — | — | US | claimed |
| WO-2023161058-A1 | COMPOSITION, ITS USE AND A PROCESS FOR SELECTIVELY ETCHING SILICON-GERMANIUM MATERIAL | BASF SE (DE) | 2023-08-31 | — | — | WO | claimed |
| WO-2023161055-A1 | COMPOSITION, ITS USE AND A PROCESS FOR SELECTIVELY ETCHING SILICON-GERMANIUM MATERIAL | BASF SE (DE) | 2023-08-31 | — | — | WO | claimed |
| EP-4200895-A1 | COMPOSITION, ITS USE AND A PROCESS FOR SELECTIVELY ETCHING SILICON-GERMANIUM MATERIAL | BASF SE (DE) | 2023-06-28 | — | — | EP | claimed |
| US-20020043644-A1 | SELECTIVE SILICON OXIDE ETCHANT FORMULATION INCLUDING FLUORIDE SALT, CHELATING AGENT, AND GLYCOL SOLVENT | ATMI PACKAGING, INC. | 2002-04-18 | — | — | US | claimed |
| US-20010050350-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS INC. | 2001-12-13 | — | — | US | claimed |
| US-6280651-B1 | CAN ETCH DIFFERENT TYPES OF SILICON OXIDE AT DIFFERENT RELATIVE ETCH RATES | ADVANCED TECHNOLOGY MATERIALS, INC. | 2001-08-28 | — | — | US | claimed |
| EP-1062682-A4 | SELECTIVE SILICON OXIDE ETCHANT FORMULATION INCLUDING FLUORIDE SALT, CHELATING AGENT AND GLYCOL SOLVENT | ADVANCED TECH MATERIALS (US) | 2001-07-04 | — | — | EP | claimed |
| US-6224785-B1 | CLEANING COMPOUNDS FOR POST PLASMA ETCHING AND ASHING | ADVANCED TECHNOLOGY MATERIALS, INC. | 2001-05-01 | — | — | US | claimed |
| EP-1062682-A1 | SELECTIVE SILICON OXIDE ETCHANT FORMULATION INCLUDING FLUORIDE SALT, CHELATING AGENT AND GLYCOL SOLVENT | ADVANCED CHEMICAL SYSTEMS INTERNATIONAL CORPORATION (US) | 2000-12-27 | — | — | EP | claimed |
| WO-1999033094-A1 | SELECTIVE SILICON OXIDE ETCHANT FORMULATION INCLUDING FLUORIDE SALT, CHELATING AGENT AND GLYCOL SOLVENT | ADVANCED CHEMICAL SYSTEMS INTERNATIONAL INC. (US) | 1999-07-01 | — | — | WO | claimed |
| WO-1998030667-A1 | SEMICONDUCTOR WAFER CLEANING COMPOSITION AND METHOD WITH AQUEOUS AMMONIUM FLUORIDE AND AMINE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 1998-07-16 | — | — | WO | claimed |
| US-4160022-A | Toothpaste | COLGATE PALMOLIVE COMPANY (US) | 1979-07-03 | — | — | US | claimed |
| US-3937804-A | TOOTHPASTE | COLGATE-PALMOLIVE COMPANY (US) | 1976-02-10 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240093089-A1 | COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING A LAYER COMPRISING AN ALUMINIUM COMPOUND IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER AND/OR COBALT | STK11, CRKL, STK10 | MAPT 1392/4885KDM4E 425/4885SMN1; SMN2 848/4885 |
| US-20260042978-A1 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TWF2, DSTYK, WNK1 | MAPT 2760/4885KDM4E 849/4885SMN1; SMN2 2389/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.