Naphthalene

Naphthalene

SCHEMBL29033941

O=C(Cl)c1cccc2ccccc12.c1ccc2ccccc2c1

nearest known ligand 0.63

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.63
NR4A2 P43354 1/20 0.63
NR4A3 Q92570 1/20 0.63
MMP3 P08254 1/20 0.57
HDAC8 Q9BY41 1/20 0.57
PTPN1 P18031 1/20 0.55
CDC25B P30305 1/20 0.55
PLK1 P53350 1/20 0.55
L3MBTL1 Q9Y468 2/20 0.53
PTK2B Q14289 1/20 0.53
ALDH1A1 P00352 6/20 0.48
ALOX15 P16050 2/20 0.48
POLB P06746 4/20 0.47
KMT2A Q03164 4/20 0.47
MAPT P10636 4/20 0.47
HPGD P15428 4/20 0.47
MEN1 O00255 3/20 0.47
LMNA P02545 3/20 0.47
NPSR1 Q6W5P4 3/20 0.47
TDP1 Q9NUW8 3/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL123694 0.98 NR4A1 (0.65) NR4A1NR4A2NR4A3MMP3HDAC8
SCHEMBL27755163 0.98 NR4A1 (0.65) NR4A1NR4A2NR4A3MMP3HDAC8
SCHEMBL29808434 0.98 NR4A1 (0.65) NR4A1NR4A2NR4A3MMP3HDAC8
Hydrochloric Acid SCHEMBL27310761 0.96 NR4A1 (0.63) NR4A1NR4A2NR4A3MMP3HDAC8
SCHEMBL28224211 0.96 NR4A1 (0.63) NR4A1NR4A2NR4A3MMP3HDAC8
Acetic Acid SCHEMBL11769219 0.90 NR4A1 (0.62) NR4A1NR4A2NR4A3MMP3HDAC8
Benzoyl Chloride SCHEMBL9712449 0.88 NR4A1 (0.60) NR4A1NR4A2NR4A3MMP3HDAC8
SCHEMBL18153975 0.86 CES2 (0.50) NR4A1NR4A2NR4A3MMP3HDAC8
SCHEMBL11436575 0.86 NR4A1 (0.52) NR4A1NR4A2NR4A3MMP3HDAC8
SCHEMBL9062637 0.86 HPRT1 (0.54) NR4A1NR4A2NR4A3MMP3HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116444460-A Oxime ester compound, photoinitiator containing oxime ester compound, photo-curing resin composition containing oxime ester compound and application of photo-curing resin composition 常州强力先端电子材料有限公司 2023-07-18 CN disclosed