Chloromethane

Chloromethane

SCHEMBL29045306

CCl.Cl[SiH2]c1ccccc1

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.36
LMNA P02545 2/20 0.35
ACHE P22303 2/20 0.35
ALOX12 P18054 1/20 0.35
MAPT P10636 1/20 0.33
HPGD P15428 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
MGLL Q99685 1/20 0.33
HSD17B10 Q99714 1/20 0.33
KCNN4 O15554 3/20 0.32
MAPK1 P28482 1/20 0.32
ALDH1A1 P00352 2/20 0.32
CYP2C19 P33261 1/20 0.31
HIF1A Q16665 1/20 0.31
TP53 P04637 1/20 0.30
BBOX1 O75936 1/20 0.30
EHMT2 Q96KQ7 1/20 0.30
EHMT1 Q9H9B1 1/20 0.30
CA4 P22748 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL167123 0.94
SCHEMBL27924220 0.94 TSHR (0.39) TSHRLMNAACHEALOX12MAPT
SCHEMBL28053619 0.91 TSHR (0.33) TSHRLMNAACHEALOX12MAPT
Hydrochloric Acid SCHEMBL6634706 0.90 TSHR (0.37) TSHRLMNAACHEALOX12MAPT
SCHEMBL21383100 0.90
Ammonia Solution, Strong SCHEMBL27746351 0.90
Water SCHEMBL27955652 0.90 TSHR (0.37) TSHRLMNAACHEALOX12MAPT
Diethylamine SCHEMBL27864499 0.80 TP53 (0.36) LMNAKCNN4TP53
Chloromethane SCHEMBL28762557 0.78 TSHR (0.44) TSHRLMNAACHEALOX12MAPT
SCHEMBL8068829 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117940850-A Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element 日产化学株式会社 2024-04-26 CN disclosed
CN-117063129-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2023-11-14 CN disclosed
CN-116547781-A Composition for forming resist underlayer film 日产化学株式会社 2023-08-04 CN disclosed