SCHEMBL8068829

SCHEMBL8068829

Cl[SiH2]c1ccc([SiH2]Cl)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL277212 0.83
SCHEMBL167123 0.81
SCHEMBL3482406 0.76 LPL (0.46)
SCHEMBL12894663 0.76 CA1 (0.58)
SCHEMBL10621839 0.76 TSHR (0.48)
Chloromethane SCHEMBL29045306 0.75 TSHR (0.36)
SCHEMBL7761705 0.70
SCHEMBL9359636 0.69 ALDH1A1 (0.40)
SCHEMBL3482930 0.60 ALDH1A1 (0.40)
SCHEMBL28707801 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0363584-B1 Silylation method GEN ELECTRIC (US) 1994-09-14 EP claimed
EP-0284873-B1 SILYLATION METHOD GENERAL ELECTRIC COMPANY (US) 1993-09-01 EP claimed
EP-0363584-A2 Silylation method GENERAL ELECTRIC COMPANY (US) 1990-04-18 EP claimed
US-4918197-A CATALYTIC REACTION BETWEEN AROMATIC ACYLHALIDE AND HALOGENATED POLYSILANE GENERAL ELECTRIC COMPANY (US) 1990-04-17 US claimed
EP-0284873-A2 Silylation method GENERAL ELECTRIC COMPANY (US) 1988-10-05 EP claimed
US-6127072-A FORMING ON BASE RESIN LAYER FOR COLORATION WHICH DEVELOPS INK ACCEPTING PROPERTY BY IRRADIATION OF LIGHT; FORMING LIGHT SCREENING LAYER ON RESIN LAYER; EXPOSING RESIN LAYER THROUGH LIGHT-SCREENING LAYER AS MASK; APPLYING COLOR INKS CANON KABUSHIKI KAISHA (JP) 2000-10-03 US disclosed
US-5976734-A Preparation process of color liquid crystal display device CANON KABUSHIKI KAISHA (JP) 1999-11-02 US disclosed