SCHEMBL29045341

SCHEMBL29045341

CC(c1ccon1)S(=O)(=O)O

nearest known ligand 0.35

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
FFAR2 O15552 1/20 0.31
KAT7 O95251 1/20 0.31
KAT6A Q92794 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29162720 0.73 SRC (0.34) NPC1RAB9A
SCHEMBL1639903 0.73
SCHEMBL1639275 0.70 ALDH1A1 (0.35) NPC1RAB9AKAT7KAT6AALDH1A1
SCHEMBL11400000 0.69
SCHEMBL14738349 0.69
SCHEMBL1272550 0.68 NPY2R (0.37) KAT7KAT6AALDH1A1
SCHEMBL536080 0.68
SCHEMBL24050466 0.65 NPC1 (0.34) NPC1RAB9AFFAR2
SCHEMBL4807002 0.65 CYP1A2 (0.47) ALDH1A1
SCHEMBL20816245 0.65 TSHR (0.40) NPC1RAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116547409-A Pulsed plasma enhanced chemical vapor deposition method and system SIO2医药产品公司 2023-08-04 CN disclosed