SCHEMBL290469

SCHEMBL290469

O=C(O)/C(=C\c1ccccc1)c1ccccc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Known targets — ChEMBL curated mechanism

ADRB2

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C1 Q04828 4/20 1.00
AKR1C3 P42330 4/20 0.68
AKR1C2 P52895 3/20 0.68
PTGS2 P35354 1/20 0.66
KMT2A Q03164 5/20 0.63
MEN1 O00255 4/20 0.63
ALDH1A1 P00352 3/20 0.63
POLB P06746 2/20 0.63
HPGD P15428 2/20 0.63
HTT P42858 2/20 0.63
MAPT P10636 2/20 0.63
KDM4E B2RXH2 1/20 0.63
LMNA P02545 1/20 0.63
MAPK1 P28482 1/20 0.63
PLA2G1B P04054 1/20 0.53
CYP1A2 P05177 1/20 0.53
CYP2D6 P10635 1/20 0.53
CYP2C9 P11712 1/20 0.53
CYP2C19 P33261 1/20 0.53
NPSR1 Q6W5P4 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL181529 1.00 AKR1C1 (1.00) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL39275 1.00 AKR1C1 (1.00) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL27448137 0.98 AKR1C1 (0.96) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
Benzophenone SCHEMBL28139683 0.94 AKR1C1 (0.88) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
Ethylene Glycol SCHEMBL27995732 0.92 AKR1C1 (0.85) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
Alcohol SCHEMBL27937505 0.90 AKR1C1 (0.81) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL9298399 0.90 AKR1C1 (0.81) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL1416571 0.90 AKR1C1 (0.81) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
Methacrylic Acid SCHEMBL1838687 0.89 AKR1C1 (0.79) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL13092046 0.88 AKR1C1 (0.78) AKR1C1AKR1C3AKR1C2PTGS2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3364 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12611368-B2 Dry compositions and/or emulsions for chemical and physical sun protection and use thereof OMYA INTERNATIONAL AG (CH) 2026-04-28 US claimed
CN-115485338-B Dry compositions and/or emulsions for chemical and physical sunscreening and uses thereof OMYA国际股份公司 2025-03-21 CN claimed
EP-4146742-B1 DRY COMPOSITIONS AND/OR EMULSIONS FOR CHEMICAL AND PHYSICAL SUN PROTECTION AND USE THEREOF OMYA INT AG (CH) 2024-12-11 EP claimed
US-20240245703-A1 TOPICAL APPLICATION OF AGENTS TO REDUCE SUN SENSITIVITY AND IMPROVE TOPICAL PHOTODYNAMIC THERAPY NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2024-07-25 US claimed
CN-113164335-B Mineral sunscreen compositions 欧莱雅 2023-11-14 CN claimed
WO-2023191649-A1 ORGANOSILICA PARTICLES BASED ON BRIDGING POLYSILSESQUIOXANES FOR BLOCKING ULTRAVIOLET RAYS Institut Biosens - Istrazivacko-Razvojni Institut Za Informacione Tehnologije Biosistema (RS) 2023-10-05 WO claimed
US-20230270645-A1 COSMETIC SUNSCREEN COMPOSITION, PROCESS FOR MANUFACTURING A COSMETIC SUNSCREEN COMPOSITION AND USE OF A COSMETIC SUNSCREEN COMPOSITION L'OREAL (FR) 2023-08-31 US claimed
CN-116546962-A Skin care composition 莱雅公司 2023-08-04 CN claimed
US-20230181431-A1 DRY COMPOSITIONS AND/OR EMULSIONS FOR CHEMICAL AND PHYSICAL SUN PROTECTION AND USE THEREOF OMYA INTERNATIONAL AG (CH) 2023-06-15 US claimed
WO-2023053097-A1 TOPICAL APPLICATION OF AGENTS TO REDUCE SUN SENSITIVITY AND IMPROVE TOPICAL PHOTODYNAMIC THERAPY THE UNITED STATES OF AMERICA AS REPRESENTED BY THE DEPARTMENT OF VETERANS AFFAIRS (US) 2023-04-06 WO claimed
EP-0824909-A2 Use of specified benzotriazole and triazine derivatives for protecting human hair against damage by U.V. rays Ciba SC Holding AG (CH) 1998-02-25 EP claimed
WO-1998000099-A1 COMPOSITIONS CONTAINING 4-TERT-BUTYL-4'-METHOXY-DIBENZOYLMETHANE, A 1,3,5-TRIAZINE DERIVATIVE AND AN ALKYL (α-CYANO)-β, β'-DIPHENYLACRYLATE AND USES L'OREAL (FR) 1998-01-08 WO claimed
EP-0815835-A1 Composition containing a 4-tertiar-butyl-4'methoxydibenzoylmethan, a 1,3,5-triazine derivative and an alkyl (alpha-cyano)-beta, beta'-diphenylacrylate and uses thereof L'OREAL (FR) 1998-01-07 EP claimed
WO-1997037634-A1 COSMETIC FILTER COMPOSITIONS CONTAINING DIBENZOYLMETHANE, ALKYL BETA'-DIPHENYLACRYLATE AND BENZOTRIAZOLE SILICONE L'OREAL (FR) 1997-10-16 WO claimed
US-5609853-A CONTAINING BENZENE-1,4-DI(3-METHYLIDENE-10-CAMPHORSULFONIC ACID), OPTIONALLY PARTIALLY OR TOTALLY NEUTRALIZED, AND 2-ETHYLHEXYL 1-CYANO-2,2-DIPHENYL ACRYLATE L'OREAL (FR) 1997-03-11 US claimed
EP-0514491-B1 LIGHT-RESISTANT FILTERING COSMETIC COMPOSITION CONTAINING A UV-A FILTER AND AN ALKYL BETA, BETA-DIPHENYLACRYLATE OR AN ALKYL ALPHA-CYANO-BETA, BETA-DIPHENYLACRYLATE OREAL (FR) 1993-11-03 EP claimed
EP-0514491-A1 LIGHT-RESISTANT FILTERING COSMETIC COMPOSITION CONTAINING A UV-A FILTER AND AN ALKYL BETA, BETA-DIPHENYLACRYLATE OR AN ALKYL ALPHA-CYANO-BETA, BETA-DIPHENYLACRYLATE. OREAL (FR) 1992-11-25 EP claimed
EP-0292554-A4 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS. RITZ GROUP LTD CHARLES (US) 1989-02-22 EP claimed
EP-0292554-A1 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS CHARLES OF THE RITZ GROUP LTD. (US) 1988-11-30 EP claimed
WO-1988004167-A1 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS CHARLES OF THE RITZ GROUP LTD. (US) 1988-06-16 WO claimed