SCHEMBL39275

SCHEMBL39275

O=C(O)C(=Cc1ccccc1)c1ccccc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Known targets — ChEMBL curated mechanism

ADRB2

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C1 Q04828 4/20 1.00
AKR1C3 P42330 4/20 0.68
AKR1C2 P52895 3/20 0.68
PTGS2 P35354 1/20 0.66
KMT2A Q03164 5/20 0.63
MEN1 O00255 4/20 0.63
ALDH1A1 P00352 3/20 0.63
POLB P06746 2/20 0.63
HPGD P15428 2/20 0.63
HTT P42858 2/20 0.63
MAPT P10636 2/20 0.63
KDM4E B2RXH2 1/20 0.63
LMNA P02545 1/20 0.63
MAPK1 P28482 1/20 0.63
PLA2G1B P04054 1/20 0.53
CYP1A2 P05177 1/20 0.53
CYP2D6 P10635 1/20 0.53
CYP2C9 P11712 1/20 0.53
CYP2C19 P33261 1/20 0.53
NPSR1 Q6W5P4 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL290469 1.00 AKR1C1 (1.00) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL181529 1.00 AKR1C1 (1.00) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL27448137 0.98 AKR1C1 (0.96) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
Benzophenone SCHEMBL28139683 0.94 AKR1C1 (0.88) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
Ethylene Glycol SCHEMBL27995732 0.92 AKR1C1 (0.85) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
Alcohol SCHEMBL27937505 0.90 AKR1C1 (0.81) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL9298399 0.90 AKR1C1 (0.81) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL1416571 0.90 AKR1C1 (0.81) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
Methacrylic Acid SCHEMBL1838687 0.89 AKR1C1 (0.79) AKR1C1AKR1C3AKR1C2PTGS2KMT2A
SCHEMBL13092046 0.88 AKR1C1 (0.78) AKR1C1AKR1C3AKR1C2PTGS2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 7591 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12611368-B2 Dry compositions and/or emulsions for chemical and physical sun protection and use thereof OMYA INTERNATIONAL AG (CH) 2026-04-28 US claimed
CN-120005367-A Flame-retardant polycarbonate composition and preparation method and application thereof 金发科技股份有限公司 2025-05-16 CN claimed
CN-119874466-A N, N-dimethylamide compound and synthesis method thereof 海南大学 2025-04-25 CN claimed
CN-119684519-A High-performance chloroprene rubber and preparation method thereof 重庆瑞淼工程技术咨询有限公司 2025-03-25 CN claimed
CN-115485338-B Dry compositions and/or emulsions for chemical and physical sunscreening and uses thereof OMYA国际股份公司 2025-03-21 CN claimed
CN-119331246-A Polyethylenimine polymer modified based on tetraphenylethylene carboxylic acid, and preparation method, product and application thereof 河北科技大学 2025-01-21 CN claimed
CN-119119374-A UV-cured high-temperature-resistant resin for thermal runaway protection material and application 武汉长盈鑫科技有限公司 2024-12-13 CN claimed
EP-4146742-B1 DRY COMPOSITIONS AND/OR EMULSIONS FOR CHEMICAL AND PHYSICAL SUN PROTECTION AND USE THEREOF OMYA INT AG (CH) 2024-12-11 EP claimed
CN-118812979-A Intermediate film for preventing laser eavesdropping and application thereof 淮安赋成新材料科技有限公司 2024-10-22 CN claimed
US-20240245703-A1 TOPICAL APPLICATION OF AGENTS TO REDUCE SUN SENSITIVITY AND IMPROVE TOPICAL PHOTODYNAMIC THERAPY NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2024-07-25 US claimed
WO-1990010001-A1 PROCESS FOR THE PREPARATION OF STILBENE DERIVATIVES EASTMAN KODAK COMPANY (US) 1990-09-07 WO claimed
EP-0385890-A1 Pocess for the preparation of stilbene derivatives EASTMAN CHEMICAL COMPANY (US) 1990-09-05 EP claimed
US-4921964-A Process for the preparation of stilbene derivatives EASTMAN KODAK COMPANY (US) 1990-05-01 US claimed
EP-0292554-A4 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS. RITZ GROUP LTD CHARLES (US) 1989-02-22 EP claimed
EP-0133357-B1 POLYMER COMPOSITION RAYCHEM LIMITED (GB) 1988-12-07 EP claimed
EP-0292554-A1 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS CHARLES OF THE RITZ GROUP LTD. (US) 1988-11-30 EP claimed
WO-1988004167-A1 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS CHARLES OF THE RITZ GROUP LTD. (US) 1988-06-16 WO claimed
US-4686099-A Aerosol waterproof sunscreen compositions CHESEBROUGH-POND'S INC. 1987-08-11 US claimed
US-4356247-A LITHOGRAPHY; PRINTING PLATES; PHOTORESISTS; HIGH-SPEED SENSITIZERS; SOTRAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1982-10-26 US claimed
US-4155394-A PLIES OF POLYESTER, NYLON AND POLYAMIDE THE GOODYEAR TIRE & RUBBER COMPANY (US) 1979-05-22 US claimed