Chloroacetic Acid

Chloroacetic Acid

SCHEMBL29049239

Cc1cccc(NCc2ccccc2)c1C.O=C(O)CCl

nearest known ligand 0.52

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.52
MAPT P10636 2/20 0.52
TP53 P04637 1/20 0.52
GAA P10253 1/20 0.52
MAPK1 P28482 1/20 0.52
POLB P06746 1/20 0.52
HTT P42858 1/20 0.48
CRHBP P24387 1/20 0.48
NPBWR1 P48145 1/20 0.48
CRHR2 Q13324 1/20 0.48
MCHR1 Q99705 1/20 0.48
HDAC1 Q13547 1/20 0.47
HDAC8 Q9BY41 1/20 0.47
HDAC6 Q9UBN7 1/20 0.47
KMT2A Q03164 2/20 0.47
LMNA P02545 2/20 0.47
MEN1 O00255 1/20 0.47
AKR1B10 O60218 1/20 0.47
TRPA1 O75762 1/20 0.47
ABCB11 O95342 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Malonic Acid SCHEMBL29049213 0.91 HSD17B10 (0.55) HSD17B10MAPTTP53GAAMAPK1
Bicarbonate SCHEMBL29049243 0.91 HSD17B10 (0.58) HSD17B10MAPTTP53GAAMAPK1
Propionic Acid SCHEMBL29049218 0.90 HSD17B10 (0.54) HSD17B10MAPTTP53GAAMAPK1
Oxalic Acid SCHEMBL29049203 0.89 HSD17B10 (0.56) HSD17B10MAPTTP53GAAMAPK1
Acetic Acid SCHEMBL29049224 0.89 HSD17B10 (0.56) HSD17B10MAPTTP53GAAMAPK1
SCHEMBL2232108 0.87 HSD17B10 (0.60) HSD17B10MAPTTP53GAAMAPK1
Trichloroacetic Acid SCHEMBL29049214 0.87 HSD17B10 (0.51) HSD17B10MAPTTP53GAAMAPK1
Dichloroacetic Acid SCHEMBL29049296 0.87 POLB (0.55) HSD17B10MAPTTP53GAAMAPK1
Hydrochloric Acid SCHEMBL4373569 0.86 HSD17B10 (0.58) HSD17B10MAPTTP53GAAMAPK1
Iodide SCHEMBL29049215 0.86 HSD17B10 (0.58) HSD17B10MAPTTP53GAAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112286000-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-12-03 CN disclosed
CN-111856882-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-11-29 CN disclosed
CN-114660896-B Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound 信越化学工业株式会社 2024-06-11 CN disclosed
CN-116804825-A Composition for forming silicon-containing metal hard mask and pattern forming method 信越化学工业株式会社 2023-09-26 CN disclosed
CN-111458980-B Composition for forming underlayer film of silicon-containing resist and method for forming pattern 信越化学工业株式会社 2023-08-11 CN disclosed