SCHEMBL2907053

SCHEMBL2907053

C=C(CC)C(=O)Oc1ccc2ccccc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.50
MEN1 O00255 2/20 0.50
MAPT P10636 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
PPARG P37231 2/20 0.47
PPARA Q07869 2/20 0.47
RAB9A P51151 2/20 0.47
PTPN7 P35236 1/20 0.46
ALDH1A1 P00352 4/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
HSD17B10 Q99714 1/20 0.45
CETP P11597 1/20 0.43
CYP1A2 P05177 2/20 0.43
CYP2A6 P11509 1/20 0.43
PDGFRB P09619 1/20 0.43
PDGFRA P16234 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
KDM4E B2RXH2 2/20 0.42
MMP1 P03956 1/20 0.42
MMP12 P39900 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL448662 0.84 PPARG (0.44) KMT2AMEN1MAPTTDP1PPARG
SCHEMBL29884423 0.84 PPARG (0.44) KMT2AMEN1MAPTTDP1PPARG
SCHEMBL11595347 0.83 PDGFRB (0.44) KMT2AMEN1MAPTTDP1PPARG
SCHEMBL13636557 0.82 KMT2A (0.46) KMT2AMEN1MAPTRAB9AALDH1A1
SCHEMBL36603 0.81 ELANE (0.58) KMT2AMEN1MAPTTDP1PPARG
SCHEMBL31476932 0.81 ELANE (0.58) KMT2AMEN1MAPTTDP1PPARG
SCHEMBL29801955 0.81 ELANE (0.58) KMT2AMEN1MAPTTDP1PPARG
SCHEMBL434641 0.81 ELANE (0.49) KMT2AMAPTTDP1RAB9AALDH1A1
SCHEMBL21881869 0.80 KMT2A (0.66) KMT2AMEN1MAPTTDP1PPARG
SCHEMBL38659578 0.80 PDGFRB (0.61) KMT2AMEN1MAPTTDP1PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9726977-B2 Coating compositions suitable for use with an overcoated photoresist GLOBALFOUNDRIES INC. (KY) 2017-08-08 US claimed
EP-2216684-B1 Method of forming a photoresist image comprising an undercoat layer ROHM & HAAS ELECT MAT (US) 2015-10-07 EP claimed
US-20100297557-A1 Coating compositions suitable for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-11-25 US claimed
EP-2216684-A1 Coating compositions suitable for use with an overcoated photoresist Rohm and Haas Electronic Materials LLC (US) 2010-08-11 EP claimed
EP-2216684-B1 Method of forming a photoresist image comprising an undercoat layer ROHM & HAAS ELECT MAT (US) 2015-10-07 EP disclosed
CN-101900943-B Coating compositions suitable for use with overcoated photoresists ROHM & HAAS ELECT MAT 2013-06-12 CN disclosed
EP-2261738-A2 Coating compositions suitable for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2010-12-15 EP disclosed
CN-101900943-A Be suitable for the coating composition that the photoresist with outer coating uses ROHM & HAAS ELECT MAT 2010-12-01 CN disclosed