SCHEMBL29077147

SCHEMBL29077147

FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18546117 1.00 LMNA (0.38) LMNATHRB
SCHEMBL295992 1.00 LMNA (0.38) LMNATHRB
SCHEMBL28713357 1.00 LMNA (0.38) LMNATHRB
SCHEMBL26094 1.00 LMNA (0.38) LMNATHRB
SCHEMBL29145793 1.00 LMNA (0.38) LMNATHRB
SCHEMBL30743163 1.00 LMNA (0.38) LMNATHRB
SCHEMBL29145792 1.00 LMNA (0.38) LMNATHRB
SCHEMBL366936 1.00 LMNA (0.38) LMNATHRB
SCHEMBL64546 1.00 LMNA (0.38) LMNATHRB
SCHEMBL64154 1.00 LMNA (0.38) LMNATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107644808-B Substrate, method of processing substrate, and processing chamber system 东京毅力科创株式会社 2023-08-22 CN claimed
CN-107644808-B Substrate, method of processing substrate, and processing chamber system 东京毅力科创株式会社 2023-08-22 CN disclosed