SCHEMBL2909708

SCHEMBL2909708

OCSCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2058205 0.78
SCHEMBL2058249 0.78
SCHEMBL3087000 0.75
SCHEMBL9787668 0.75 TDP1 (0.50)
SCHEMBL2058366 0.71
SCHEMBL8023454 0.71
SCHEMBL4588157 0.71
SCHEMBL14849285 0.71
SCHEMBL8033212 0.71
SCHEMBL13180696 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 271 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119504529-A Phenolic antioxidant and synthetic method and application thereof 西安近代化学研究所 2025-02-25 CN claimed
WO-2001096428-A1 COPOLYMERS AND COPOLYMER DISPERSIONS, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE BASF COATINGS AG (DE) 2001-12-20 WO claimed
JP-63122754-A None JP disclosed
JP-7233094-A None JP disclosed
EP-3931234-B1 STORAGE STABLE PIGMENTED ISOCYANATE GROUP-CONTAINING FORMULATIONS COMPRISING ISOCYANATE GROUP-CONTAINING RUBBING RESIN AND THEIR USE COVESTRO DEUTSCHLAND AG (DE) 2025-10-15 EP disclosed
CN-119604785-A Optical material and spectacle lens 三井化学株式会社 2025-03-11 CN disclosed
CN-119504529-A Phenolic antioxidant and synthetic method and application thereof 西安近代化学研究所 2025-02-25 CN disclosed
EP-4277941-B1 COMPOSITIONS CONTAINING URETDIONE GROUPS COVESTRO DEUTSCHLAND AG (DE) 2025-01-01 EP disclosed
EP-3601405-B1 GENERATION OF POLYISOCYANURATE LAYERS THROUGH SEPARATE APPLICATION OF ISOCYANATE COMPONENTS AND CATALYSTS COVESTRO DEUTSCHLAND AG (DE) 2024-08-28 EP disclosed
CN-118244576-A Photosensitive resin composition and cured film thereof 罗门哈斯电子材料韩国有限公司 2024-06-25 CN disclosed
CN-110643010-B Isocyanate composition and optical resin prepared from same 万华化学集团股份有限公司 2024-04-09 CN disclosed
EP-0686613-A1 OZONIDE REDUCING AGENT OTSUKA KAGAKU KABUSHIKI KAISHA (JP) 1995-12-13 EP disclosed
JP-H07233094-A OZONIDE REDUCING AGENT OTSUKA CHEM CO LTD 1995-09-05 JP disclosed
CN-1020129-C Plastic lens having high-refractive index and its method for preparation of the lens MITSUL TOATSU CHEMICALS INC (JP) 1993-03-17 CN disclosed
US-5053549-A Dodecyl hydroxymethyl sulfide PHILLIPS PETROLEUM COMPANY (US) 1991-10-01 US disclosed
US-4939302-A Process for preparing stable organic hydroxysulfide compositions PHILLIPS PETROLEUM COMPANY (US) 1990-07-03 US disclosed
CN-1036269-A Plastic lens and manufacture method thereof with high index MITSUI TOATSU CHEMICALS (JP) 1989-10-11 CN disclosed
JP-S63122754-A ANTISTATIC POLYESTER COMPOSITION NIPPON ESTER CO LTD 1988-05-26 JP disclosed
EP-0162261-A1 Sulphur containing polyetherurethans, process for their preparation and their use BAYER AG (DE) 1985-11-27 EP disclosed
US-4203757-A Halophenoxyalkoxy phosphorous-containing sulfides GAF CORPORATION (US) 1980-05-20 US disclosed