⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29130282 | 0.90 | — | — | |
| SCHEMBL29226902 | 0.85 | — | — | |
| SCHEMBL128997 | 0.82 | TSHR (0.44) | — | |
| SCHEMBL352462 | 0.79 | — | — | |
| Methacrylic Acid SCHEMBL25435014 | 0.79 | TSHR (0.41) | — | |
| SCHEMBL6827051 | 0.77 | MAPT (0.33) | — | |
| Acrylic Acid SCHEMBL8676132 | 0.76 | TSHR (0.38) | — | |
| Acrylic Acid Methyl Ester SCHEMBL27478060 | 0.76 | TSHR (0.35) | — | |
| SCHEMBL6826961 | 0.76 | GSTP1 (0.33) | — | |
| SCHEMBL15238394 | 0.76 | GSTP1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117836927-A | Resin cured film, semiconductor device, and method for manufacturing semiconductor device | 株式会社力森诺科 | 2024-04-05 | — | — | CN | disclosed |
| CN-117280447-A | Photosensitive resin composition selection method, pattern cured film production method, cured film, semiconductor device, and semiconductor device production method | 株式会社力森诺科 | 2023-12-22 | — | — | CN | disclosed |