Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 7/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 5/20 | 0.41 |
| ▸ | TSHR | P16473 | 4/20 | 0.41 |
| ▸ | GFER | P55789 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8100164 | 1.00 | MAPT (0.42) | MAPTMEN1KMT2ATDP1ALDH1A1 | |
| SCHEMBL48724 | 1.00 | MAPT (0.42) | MAPTMEN1KMT2ATDP1ALDH1A1 | |
| Benzene SCHEMBL28278798 | 0.97 | TSHR (0.41) | MAPTMEN1KMT2ATDP1ALDH1A1 | |
| SCHEMBL3049115 | 0.93 | HTR2A (0.46) | MAPTTDP1ALDH1A1CYP3A4TSHR | |
| SCHEMBL28334382 | 0.93 | TDP1 (0.50) | MAPTMEN1KMT2ATDP1ALDH1A1 | |
| SCHEMBL8102257 | 0.91 | ESR1 (0.39) | MAPTMEN1KMT2ATDP1ALDH1A1 | |
| SCHEMBL8099783 | 0.91 | ESR1 (0.39) | MAPTMEN1KMT2ATDP1ALDH1A1 | |
| SCHEMBL8771542 | 0.91 | ACHE (0.56) | MAPTMEN1KMT2ATDP1ALDH1A1 | |
| SCHEMBL8086224 | 0.89 | CYP3A4 (0.58) | MAPTTDP1ALDH1A1CYP3A4TSHR | |
| SCHEMBL8087187 | 0.89 | CNR1 (0.39) | MAPTMEN1KMT2ATDP1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9732198-B2 | Mono- and multi-layer blown films | BASF SE (DE) | 2017-08-15 | — | — | US | disclosed |
| US-20170081486-A1 | Mono- and Multi-Layer Blown Films | BASF SE (DE) | 2017-03-23 | — | — | US | disclosed |
| US-20160136871-A1 | Mono- and Multi-Layer Blown Films | BASF SE (DE) | 2016-05-19 | — | — | US | disclosed |
| US-9278487-B2 | Mono-and multi-layer blown films | BASF SE (DE) | 2016-03-08 | — | — | US | disclosed |
| US-20130210973-A1 | PROCESS FOR IMPROVING THE FLOW PROPERTIES OF POLYMER MELTS | BASF SE (DE) | 2013-08-15 | — | — | US | disclosed |
| US-20130161875-A1 | MONO-AND MULTI-LAYER BLOWN FILMS | BASF SE (DE) | 2013-06-27 | — | — | US | disclosed |
| EP-1369221-B9 | SUCCESSIVELY BIAXIAL-ORIENTED POROUS POLYPROPYLENE FILM AND PROCESS FOR PRODUCTION THEREOF | NEW JAPAN CHEM CO LTD (JP) | 2010-12-29 | — | — | EP | disclosed |
| EP-2026965-B1 | MONO- AND MULTI-LAYER BLOWN FILMS | BASF SE (DE) | 2010-09-01 | — | — | EP | disclosed |
| US-7682689-B2 | A polypropylene-based resin and a beta-crystal nucleating agent having a film thickness uniformity of < 0.1 and the film exhibiting good stability; high air-permeability and porosity; good feeling and electrical resistance required for a battery separator; industrial scale; | NEW JAPAN CHEMICAL CO., LTD. (JP) | 2010-03-23 | — | — | US | disclosed |
| US-20090318593-A1 | Process for Improving the Flow Properties of Polymer Melts | UNIVERSITAT BAYREUTH (DE) | 2009-12-24 | — | — | US | disclosed |
| EP-0557721-B1 | Polypropylene moulded articles with increased -crystal content and bisamides as -nucleating agents. | NEW JAPAN CHEM CO LTD (JP) | 2000-10-04 | — | — | EP | disclosed |
| EP-0726500-B1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2000-05-31 | — | — | EP | disclosed |
| EP-0984051-A1 | HEAT-RESISTANT ADHESIVES AND SEMICONDUCTOR DEVICES PRODUCED THEREWITH | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-03-08 | — | — | EP | disclosed |
| EP-0962489-A2 | Crystalline polypropylene resin composition and amide compounds | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1999-12-08 | — | — | EP | disclosed |
| US-5973076-A | MOLDING; CONTROLLING TEMPERATURE IN PRESENCE OF AN AMIDE COMPOUND | NEW JAPAN CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| EP-0776933-B1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEM CO LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| EP-0776933-A1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1997-06-04 | — | — | EP | disclosed |
| US-5491188-A | ADDING DIAMIDE COMPOUNDS AS NUCLEATING AGENT TO PROPYLENE HOMO-, CO- AND TERPOLYMERS; FILTRATION MEMBRANES, PRINTING SHEETS | NEW JAPAN CHEMICAL CO., LTD. (JP) | 1996-02-13 | — | — | US | disclosed |
| EP-0632095-A2 | Porous stretched article of polypropylene-based resin and process for its preparation | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1995-01-04 | — | — | EP | disclosed |
| EP-0557721-A2 | Crystalline polypropylene resin composition and amide compounds | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1993-09-01 | — | — | EP | disclosed |