SCHEMBL2915274

SCHEMBL2915274

C[CH]c1ccc(CCCCCCC)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.59
ADRA2A P08913 2/20 0.59
ADORA3 P0DMS8 2/20 0.59
TACR2 P21452 2/20 0.59
SLC6A2 P23975 2/20 0.59
SLC6A4 P31645 2/20 0.59
SLC6A3 Q01959 2/20 0.59
CYP3A4 P08684 2/20 0.59
HSD17B10 Q99714 2/20 0.59
ALDH1A1 P00352 2/20 0.59
KDM4E B2RXH2 1/20 0.59
LMNA P02545 1/20 0.59
SHBG P04278 1/20 0.59
TP53 P04637 1/20 0.59
HSPD1 P10809 1/20 0.59
ADRB3 P13945 1/20 0.59
HTR2C P28335 1/20 0.59
HSPE1 P61604 1/20 0.59
HIF1A Q16665 1/20 0.59
TST Q16762 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1611470 1.00 ESR1 (0.59) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL698307 1.00 ESR1 (0.59) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL7530228 1.00 ESR1 (0.59) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL9753197 1.00 ESR1 (0.59) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL677468 1.00 ESR1 (0.59) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL1609473 0.98 ESR1 (0.55) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL329513 0.91 CA2 (0.50) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL8371449 0.86 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL27929252 0.86 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL17160009 0.86 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115210239-A Aromatic compound, organic semiconductor layer and organic thin film transistor 东曹株式会社 2022-10-18 CN disclosed
EP-1467251-B1 Positive resist composition FUJIFILM CORP (JP) 2010-09-08 EP disclosed
US-20080096130-A1 POSITIVE RESIST COMPOSITION FUJIFILM CORPORATION 2008-04-24 US disclosed
US-7361446-B2 Sensitivity, high resolution, good pattern profile, used for super-microlithography FUJIFILM CORPORATION (JP) 2008-04-22 US disclosed
EP-1467251-A1 Positive resist composition Fuji Photo Film Co., Ltd. (JP) 2004-10-13 EP disclosed
US-20040197702-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2004-10-07 US disclosed
US-6727033-B2 A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20030134221-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 US disclosed