SCHEMBL2916092

SCHEMBL2916092

O=C(O)C[C@H](N[C@H](CC(=O)O)C(=O)O)C(=O)O

nearest known ligand 0.64

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.48
CA4 P22748 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.46
SLC22A6 Q4U2R8 1/20 0.43
MME P08473 4/20 0.41
FOLH1 Q04609 2/20 0.41
RIMKLA Q8IXN7 1/20 0.41
NAALAD2 Q9Y3Q0 1/20 0.41
TGFBR1 P36897 1/20 0.39
GAA P10253 1/20 0.39
MAPT P10636 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22019 1.00 CA2 (0.48) CA2CA4TDP1SMN1; SMN2SLC22A6
SCHEMBL2910640 1.00 CA2 (0.48) CA2CA4TDP1SMN1; SMN2SLC22A6
SCHEMBL1457564 1.00 CA2 (0.48) CA2CA4TDP1SMN1; SMN2SLC22A6
SCHEMBL3055923 0.97 CA2 (0.47) CA2CA4TDP1SMN1; SMN2SLC22A6
Ammonia Solution, Strong SCHEMBL4612095 0.97 TDP1 (0.52) CA2CA4TDP1SMN1; SMN2SLC22A6
SCHEMBL786600 0.97 CA2 (0.47) CA2CA4TDP1SMN1; SMN2SLC22A6
SCHEMBL5327417 0.97 CA2 (0.47) CA2CA4TDP1SMN1; SMN2SLC22A6
SCHEMBL1419353 0.97 CA2 (0.47) CA2CA4TDP1SMN1; SMN2SLC22A6
SCHEMBL18419474 0.97 CA2 (0.47) CA2CA4TDP1SMN1; SMN2SLC22A6
SCHEMBL9983146 0.97 CA2 (0.47) CA2CA4TDP1SMN1; SMN2SLC22A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080115423-A1 Polishing Composition For Silicon Wafer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-05-22 US claimed
US-20020039980-A1 Chelating agent and detergent comprising the same MITSUBISHI RAYON CO., LTD. 2002-04-04 US claimed
US-20010034318-A1 Chelating agent and detergent comprising the same NITTO CHEMICAL INDUSTRY CO., LTD (NAME CHANGED TO MITSUBISHI RAYON CO., LTD.) 2001-10-25 US claimed
EP-0783034-A2 Chelating agent and detergent comprising the same NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1997-07-09 EP claimed
WO-2025202211-A1 GRANULES BASED ON SODIUM IMINODISUCCINATE, METHODS FOR PREPARING SAME AND USES THEREOF IN SOLID COSMETIC COMPOSITIONS BRENNTAG HOLDING GMBH (DE) 2025-10-02 WO disclosed
EP-0783034-B1 Chelating agent and detergent comprising the same MITSUBISHI RAYON CO (JP) 2010-08-18 EP disclosed
US-20080115423-A1 Polishing Composition For Silicon Wafer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-05-22 US disclosed
US-6451757-B2 ASPARTIC ACID, MALEIC ACID, ACRYLIC ACID, MALIC ACID, GLYCINE, GLYCOLIC ACID, IMINODIACETIC ACID, NITRILOTRIACETIC ACID, ALPHA-ALANINE, BETA-ALANINE, IMINODIPROPIONIC ACID, FUMARIC ACID, A SYNTHETIC AMINO ACID; BIODEGRADABLE MITSUBISHI RAYON CO., LTD. (JP) 2002-09-17 US disclosed
US-6426229-B1 ASPARTIC, MALEIC, ACRYLIC, MALIC, GLYCINE, GLYCOLIC,IMINODIACETIC, NITRILOTRIACETIC,BETA-ALANINE, IMINODIPROPIONIC, AND FUMARIC ACIDS, SYNTHETIC STARTING AND INTERMEDIATE AMINO ACIDS; BIODEGRADAABLE MITSUBISHI RAYON CO., LTD. (JP) 2002-07-30 US disclosed
US-20020039980-A1 Chelating agent and detergent comprising the same MITSUBISHI RAYON CO., LTD. 2002-04-04 US disclosed
US-20010034318-A1 Chelating agent and detergent comprising the same NITTO CHEMICAL INDUSTRY CO., LTD (NAME CHANGED TO MITSUBISHI RAYON CO., LTD.) 2001-10-25 US disclosed
US-6221834-B1 (S)-ASPARTIC ACID-N,N-DIACETIC ACID (ASDA) OR ALKALI METAL SALTS OR AMMONIA SALTS THEREOF AND (II) ASPARTIC ACID, MALIC ACID, IMINODIACETIC ACID (IDA), NITRILOTRIACETIC ACID (NTA) OR FUMARIC ACID MITSUBISHI RAYON CO., LTD. (JP) 2001-04-24 US disclosed
EP-0783034-A2 Chelating agent and detergent comprising the same NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1997-07-09 EP disclosed