SCHEMBL29193733

SCHEMBL29193733

CCCC[n+]1ccn(C)c1.CCCC[n+]1ccn(C)c1.F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19457923 1.00 — —
SCHEMBL25218398 0.98 — —
SCHEMBL28507261 0.98 — —
Alcohol SCHEMBL28539843 0.95 CA1 (0.35) —
SCHEMBL22075519 0.95 — —
Methylene Chloride SCHEMBL21803801 0.95 — —
SCHEMBL25364329 0.95 ABCB11 (0.41) —
SCHEMBL28556395 0.93 — —
SCHEMBL22639041 0.93 CHRM2 (0.44) —
SCHEMBL21798545 0.93 CHRM2 (0.44) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117903890-A Low-corrosion and low-residue semiconductor cleaning solution, preparation method and application thereof 浙江奥首材料科技有限公司 2024-04-19 — — CN disclosed
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