⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25679012 | 0.83 | — | — | |
| SCHEMBL12202678 | 0.81 | — | — | |
| SCHEMBL2744058 | 0.76 | — | — | |
| SCHEMBL3893317 | 0.72 | — | — | |
| SCHEMBL13287217 | 0.69 | — | — | |
| SCHEMBL4395507 | 0.67 | LMNA (0.32) | — | |
| SCHEMBL20214430 | 0.65 | — | — | |
| SCHEMBL838012 | 0.65 | — | — | |
| SCHEMBL838349 | 0.61 | — | — | |
| SCHEMBL13453130 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1688423-B1 | Silylation of hydroxyl group-containing compounds | SHINETSU CHEMICAL CO (JP) | 2010-09-08 | — | — | EP | disclosed |
| EP-1688423-A1 | Silylation of hydroxyl group-containing compounds | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-08-09 | — | — | EP | disclosed |
| EP-1334975-B1 | Silylation of hydroxyl group-containing compounds | SHINETSU CHEMICAL CO (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-6875880-B2 | Silylation of hydroxyl groups | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2005-04-05 | — | — | US | disclosed |
| US-6764807-B2 | LITHOGRAPHY | KODAK POLYCHROME GRAPHICS LLC | 2004-07-20 | — | — | US | disclosed |
| EP-1334975-A1 | Silylation of hydroxyl group-containing compounds | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-08-13 | — | — | EP | disclosed |
| US-20030139619-A1 | Silylation of hydroxyl groups | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20020086235-A1 | Lithography | EASTMAN KODAK COMPANY | 2002-07-04 | — | — | US | disclosed |
| US-6399271-B1 | HYDROXY CONTAINING COMPOUND WITH AFFINITY FOR INK, AND TITANIUM OR SILICON CONTAINING COMPOUND WITH DIFFERENT AFFINITY FOR INK | KODAK POLYCHROME GRAPHICS LLC | 2002-06-04 | — | — | US | disclosed |
| EP-0377175-A2 | Pattern forming composition and process for forming pattern using the same | HITACHI, LTD. (JP) | 1990-07-11 | — | — | EP | disclosed |
| US-4737563-A | USING DIHYDROISOPROPENYLOXYSILANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-04-12 | — | — | US | disclosed |