Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPL | P06858 | 3/20 | 0.54 |
| ▸ | LIPG | Q9Y5X9 | 3/20 | 0.54 |
| ▸ | PPARA | Q07869 | 5/20 | 0.47 |
| ▸ | PPARG | P37231 | 3/20 | 0.47 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL677064 | 1.00 | LPL (0.54) | LPLLIPGPPARAPPARGKCNH2 | |
| SCHEMBL677009 | 1.00 | LPL (0.54) | LPLLIPGPPARAPPARGKCNH2 | |
| SCHEMBL677236 | 0.98 | LPL (0.53) | LPLLIPGPPARAPPARGTDP1 | |
| SCHEMBL2918719 | 0.93 | LPL (0.46) | LPLLIPGPPARAPPARGTDP1 | |
| SCHEMBL28305258 | 0.86 | LPL (0.51) | LPLLIPGPPARAPPARGKCNH2 | |
| SCHEMBL2920783 | 0.85 | CNR1 (0.39) | LPLLIPG | |
| SCHEMBL11431846 | 0.84 | LPL (0.53) | LPLLIPGPPARAPPARGKCNH2 | |
| SCHEMBL489093 | 0.84 | LPL (0.53) | LPLLIPGPPARAPPARGTDP1 | |
| SCHEMBL11429526 | 0.84 | LPL (0.53) | LPLLIPGPPARAPPARGKCNH2 | |
| SCHEMBL4083034 | 0.84 | LPL (0.53) | LPLLIPGPPARAPPARG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| EP-1467251-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20040197702-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| US-6727033-B2 | A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |