Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPL | P06858 | 3/20 | 0.57 |
| ▸ | LIPG | Q9Y5X9 | 3/20 | 0.57 |
| ▸ | PPARG | P37231 | 2/20 | 0.49 |
| ▸ | PPARA | Q07869 | 2/20 | 0.49 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.46 |
| ▸ | SPHK2 | Q9NRA0 | 3/20 | 0.46 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL677065 | 1.00 | LPL (0.57) | LPLLIPGPPARGPPARAKCNH2 | |
| SCHEMBL29248328 | 1.00 | LPL (0.57) | LPLLIPGPPARGPPARAKCNH2 | |
| SCHEMBL677010 | 1.00 | LPL (0.57) | LPLLIPGPPARGPPARAKCNH2 | |
| SCHEMBL677237 | 0.98 | LPL (0.56) | LPLLIPGPPARGPPARASPHK2 | |
| SCHEMBL2918721 | 0.92 | LPL (0.49) | LPLLIPGPPARGPPARATDP1 | |
| SCHEMBL4032533 | 0.90 | LPL (0.67) | LPLLIPGPPARGPPARAKCNH2 | |
| SCHEMBL29742685 | 0.90 | LPL (0.67) | LPLLIPGPPARGPPARAKCNH2 | |
| SCHEMBL6932623 | 0.90 | LPL (0.67) | LPLLIPGPPARGPPARAKCNH2 | |
| SCHEMBL5249436 | 0.90 | LPL (0.67) | LPLLIPGPPARGPPARAKCNH2 | |
| SCHEMBL10518886 | 0.90 | LPL (0.67) | LPLLIPGPPARGPPARAKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| EP-1467251-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20040197702-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| US-6727033-B2 | A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |