⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL57575 | 0.76 | GSTP1 (0.32) | — | |
| SCHEMBL5612527 | 0.74 | — | — | |
| SCHEMBL26370677 | 0.74 | — | — | |
| SCHEMBL6826957 | 0.71 | HDAC3 (0.32) | — | |
| SCHEMBL25893402 | 0.71 | — | — | |
| SCHEMBL2849744 | 0.71 | P2RX7 (0.31) | — | |
| SCHEMBL10355371 | 0.71 | — | — | |
| SCHEMBL19433029 | 0.70 | CASR (0.32) | — | |
| Acrylic Acid SCHEMBL8676130 | 0.70 | — | — | |
| Methacrylic Acid SCHEMBL1454554 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 539 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| US-20240240040-A1 | INK JET RECORDING INK AND INK JET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2024-07-18 | — | — | US | disclosed |
| EP-4400552-A1 | ACTIVE ENERGY RAY-CURABLE INKJET INK AND IMAGE RECORDING METHOD | FUJIFILM Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | disclosed |
| US-20240224409-A1 | ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-4389834-A1 | ACTIVE-ENERGY-RAY-CURABLE INK, INK SET, AND IMAGE RECORDING METHOD | FUJIFILM Corporation (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-20240206077-A1 | MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024128086-A1 | CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | 富士フイルム株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122204-A1 | ACTIVE ENERGY RAY-CURABLE INKJET INK, ACTIVE ENERGY RAY-CURABLE INK SET, AND IMAGE RECORDING METHOD | 富士フイルム株式会社 | 2024-06-13 | — | — | WO | disclosed |
| US-20240196519-A1 | ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2024-06-13 | — | — | US | disclosed |
| EP-1724315-A2 | Ink composition, inkjet recording method and process for producing lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2006-11-22 | — | — | EP | disclosed |
| US-20060258776-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJI PHOTO FILM CO., LTD. | 2006-11-16 | — | — | US | disclosed |
| EP-1721943-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2006-11-15 | — | — | EP | disclosed |
| US-20060211785-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJI PHOTO FILM., LTD. | 2006-09-21 | — | — | US | disclosed |
| EP-1702962-A1 | Ink composition containing a photo-acid and a photo-base generator and processes using them | Fuji Photo Film Co., Ltd. (JP) | 2006-09-20 | — | — | EP | disclosed |
| US-20060178449-A1 | Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate | FUJI PHOTO FILM CO., LTD. | 2006-08-10 | — | — | US | disclosed |
| US-20060174799-A1 | including a cationically polymerizable compound, a compound that generates acid by irradiation with a radiation ray, and a basic compound that becomes less basic by irradiation with a radiation ray; curable with high sensitivity to a radiation ray | FUJI PHOTO FILM CO., LTD. | 2006-08-10 | — | — | US | disclosed |
| EP-1688468-A1 | Ink composition and planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-09 | — | — | EP | disclosed |
| EP-1688467-A1 | Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate | Fuji Photo Film Co., Ltd. (JP) | 2006-08-09 | — | — | EP | disclosed |