Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL1478546 | 0.90 | TDP1 (0.48) | CYP1A2TDP1ALDH1A1KDM4E | |
| N-Methylpiperidine SCHEMBL28085993 | 0.85 | MAPT (0.37) | CYP1A2TDP1ALDH1A1KDM4ELMNA | |
| N-Methylpiperidine SCHEMBL3849400 | 0.85 | ALDH1A1 (0.47) | CYP1A2TDP1ALDH1A1KDM4ELMNA | |
| N-Methylpiperidine SCHEMBL3145445 | 0.85 | CYP1A2 (0.48) | CYP1A2TDP1ALDH1A1KDM4ELMNA | |
| N-Methylpiperidine SCHEMBL1050930 | 0.82 | CYP1A2 (0.46) | CYP1A2TDP1ALDH1A1KDM4ELMNA | |
| N-Methyl Pyrrolidine (Nmp) SCHEMBL1687141 | 0.82 | CYP1A2 (0.50) | CYP1A2TDP1ALDH1A1KDM4ELMNA | |
| N-Methylpiperidine SCHEMBL11210549 | 0.82 | CYP1A2 (0.50) | CYP1A2TDP1ALDH1A1KDM4ELMNA | |
| N-Methyl Pyrrolidine (Nmp) SCHEMBL9368873 | 0.82 | KDM4E (0.44) | CYP1A2TDP1ALDH1A1KDM4ELMNA | |
| Methacrylic Acid SCHEMBL4124103 | 0.82 | TDP1 (0.44) | TDP1ALDH1A1KDM4ELMNA | |
| Methacrylic Acid SCHEMBL4134914 | 0.82 | TDP1 (0.44) | TDP1ALDH1A1KDM4ELMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118092072-A | Acid development type photosensitive resin composition, preparation method thereof and photosensitive dry film | 湖南初源新材料股份有限公司 | 2024-05-28 | — | — | CN | claimed |