Acrylic Acid Methyl Ester

Acrylic Acid Methyl Ester

SCHEMBL29288449

C=C(C)C(=O)OC(C)N(CC)CC.C=CC(=O)OC

nearest known ligand 0.36

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Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.36
TSHR P16473 3/20 0.34
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28866554 0.87 TSHR (0.33) TSHR
Acrylic Acid SCHEMBL7775516 0.86 TSHR (0.37) ALDH1A1TSHR
SCHEMBL28273631 0.86 TSHR (0.44) ALDH1A1TSHR
SCHEMBL14873 0.86 TSHR (0.44) ALDH1A1TSHR
Acrylamide SCHEMBL28259159 0.85 TSHR (0.36) ALDH1A1TSHR
Hydrochloric Acid SCHEMBL9258461 0.84 TSHR (0.42) ALDH1A1TSHR
Ammonia Solution, Strong SCHEMBL28263372 0.84 TSHR (0.42) ALDH1A1TSHR
Chloromethane SCHEMBL1128070 0.82 TSHR (0.41) ALDH1A1TSHR
Isopropyl Alcohol SCHEMBL20480785 0.82 TSHR (0.41) ALDH1A1TSHR
Acetic Acid SCHEMBL27216306 0.82 TSHR (0.41) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109388026-A The forming method of photoresist, the forming method of corrosion-resisting pattern and conductive pattern 日兴材料株式会社 2019-02-26 CN disclosed