SCHEMBL293064

SCHEMBL293064

C=COCCCCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3789161 0.97 ALDH1A1 (0.33)
SCHEMBL755811 0.97 ALDH1A1 (0.33)
SCHEMBL15611375 0.97 ALDH1A1 (0.33)
SCHEMBL15611655 0.97
SCHEMBL4955502 0.95
SCHEMBL753934 0.92
SCHEMBL27767541 0.85 CDC25A (0.34)
SCHEMBL64718 0.85 CDC25A (0.34)
SCHEMBL18675767 0.82 ALDH1A1 (0.38)
SCHEMBL3048726 0.82 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 808 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11693317-B2 Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US claimed
US-6495636-B2 A 3-(ETHYLENEOXYALKYLOXYALKYL)OXETANE AND DERIVATIVES; COPOLYMERIZED WITH A 1,1-DIFLUOROETHYLENE OR DERIVATIVE; VERY COMPATIBLE AND COPOLYMERIZABLE WITH UNSATURATED COMPOUNDS; WATERPROOFING; RADIATION TRANSPARENT JSR CORPORATION (JP) 2002-12-17 US claimed
US-3950281-A DIENE RUBBERS, CURABLE SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-04-13 US claimed
EP-4744902-A1 ON-PRESS DEVELOPMENT-TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, PLANOGRAPHIC PRINTING PLATE PRODUCTION METHOD, AND PLANOGRAPHIC PRINTING METHO FUJIFILM Corporation (JP) 2026-05-20 EP disclosed
EP-4744901-A1 ON-PRESS DEVELOPMENT TYPE PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, PLANOGRAPHIC PRINTING METHOD, AND COMPOUND FUJIFILM Corporation (JP) 2026-05-20 EP disclosed
US-20260131567-A1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING METHOD, AND COMPOUND FUJIFILM CORPORATION (JP) 2026-05-14 US disclosed
US-20260131566-A1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORPORATION (JP) 2026-05-14 US disclosed
EP-4316850-B1 ELECTRON BEAM CURING INKJET INK, INK SET, AND IMAGE RECORDING METHOD FUJIFILM CORP (JP) 2026-04-22 EP disclosed
EP-4286163-B1 ELECTRON BEAM CURABLE INK, AND IMAGE RECORDING METHOD FUJIFILM CORP (JP) 2026-04-01 EP disclosed
EP-4186708-B1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING A LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORP (JP) 2026-03-04 EP disclosed
US-12501540-B2 Electronic device and manufacturing method thereof FUJIFILM CORPORATION (JP) 2025-12-16 US disclosed
EP-0643760-A1 POLY(VINYL ETHER) AMINOCARBAMATES AND FUEL COMPOSITIONS CONTAINING THE SAME CHEVRON CHEMICAL COMPANY (US) 1995-03-22 EP disclosed
EP-0643759-A1 POLY(ALKYLENE ETHER) HYDROXY (OXYPROPYLENE) AMINES AND FUEL COMPOSITIONS CONTAINING THE SAME CHEVRON CHEMICAL COMPANY (US) 1995-03-22 EP disclosed
WO-1994022986-A1 POLY(VINYL ETHER) AMINOCARBAMATES AND FUEL COMPOSITIONS CONTAINING THE SAME CHEVRON RESEARCH AND TECHNOLOGY COMPANY, A DIVISION OF CHEVRON U.S.A. INC. (US) 1994-10-13 WO disclosed
WO-1994022987-A1 POLY(VINYL ETHER) AMINES AND FUEL COMPOSITIONS CONTAINING THE SAME CHEVRON RESEARCH AND TECHNOLOGY COMPANY, A DIVISION OF CHEVRON U.S.A. INC. (US) 1994-10-13 WO disclosed
WO-1994022985-A1 POLY(ALKYLENE ETHER) HYDROXY (OXYPROPYLENE) AMINES AND FUEL COMPOSITIONS CONTAINING THE SAME CHEVRON RESEARCH AND TECHNOLOGY COMPANY, A DIVISION OF CHEVRON U.S.A. INC. (US) 1994-10-13 WO disclosed
US-5306315-A Fuel additive; antideposit agents; fuel concentrate CHEVRON RESEARCH AND TECHNOLOGY COMPANY (US) 1994-04-26 US disclosed
US-5306314-A Fuel additive; antideposit agents CHEVRON RESEARCH AND TECHNOLOGY COMPANY (US) 1994-04-26 US disclosed
US-5306316-A Poly(alkylene ether) amines having a hydroxy(oxypropylene) connecting group CHEVRON RESEARCH AND TECHNOLOGY COMPANY (US) 1994-04-26 US disclosed
US-3950281-A DIENE RUBBERS, CURABLE SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-04-13 US disclosed