Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 13/20 | 1.00 |
| ▸ | SMPD1 | P17405 | 5/20 | 1.00 |
| ▸ | GGPS1 | O95749 | 7/20 | 0.63 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.59 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.59 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11773363 | 1.00 | FDPS (1.00) | FDPSSMPD1GGPS1LPAR1LPAR3 | |
| SCHEMBL11329196 | 1.00 | FDPS (1.00) | FDPSSMPD1GGPS1LPAR1LPAR3 | |
| SCHEMBL4088168 | 1.00 | FDPS (1.00) | FDPSSMPD1GGPS1LPAR1LPAR3 | |
| SCHEMBL11803650 | 1.00 | FDPS (1.00) | FDPSSMPD1GGPS1LPAR1LPAR3 | |
| SCHEMBL11793619 | 1.00 | FDPS (1.00) | FDPSSMPD1GGPS1LPAR1LPAR3 | |
| SCHEMBL4094991 | 1.00 | FDPS (1.00) | FDPSSMPD1GGPS1LPAR1LPAR3 | |
| SCHEMBL3414399 | 0.98 | FDPS (1.00) | FDPSSMPD1GGPS1LPAR1LPAR3 | |
| SCHEMBL4734366 | 0.91 | FDPS (1.00) | FDPSSMPD1GGPS1LPAR1LPAR3 | |
| SCHEMBL8825784 | 0.86 | FDPS (0.77) | FDPSSMPD1GGPS1 | |
| SCHEMBL5689723 | 0.83 | FDPS (0.70) | FDPSSMPD1GGPS1LPAR1LPAR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119024654-A | Method for forming pattern | 三星SDI株式会社 | 2024-11-26 | — | — | CN | claimed |
| CN-118963076-A | Composition, method of forming pattern, and system for forming pattern | 三星SDI株式会社 | 2024-11-15 | — | — | CN | claimed |
| CN-117597628-A | Method for forming pattern | 三星SDI株式会社 | 2024-02-23 | — | — | CN | claimed |
| CN-117348341-A | Metal-containing photoresist developer composition and pattern forming method | 三星SDI株式会社 | 2024-01-05 | — | — | CN | claimed |
| CN-116482935-A | Method for forming pattern | 三星SDI株式会社 | 2023-07-25 | — | — | CN | claimed |
| US-8211286-B2 | Electrolyte and method for depositing decorative and technical layers of black ruthenium | Umicore Galvotechnik GmbH (DE) | 2012-07-03 | — | — | US | claimed |
| EP-2310558-B1 | IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF TIN-BRONZE LAYERS | UMICORE GALVANOTECHNIK GMBH (DE) | 2012-03-14 | — | — | EP | claimed |
| JP-2011527381-A | — | — | 2011-10-27 | — | — | JP | claimed |
| US-20110174631-A1 | COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS | UMICORE GALVANOTECHNIK GMBH (DE) | 2011-07-21 | — | — | US | claimed |
| EP-2310558-A1 | IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS | Umicore Galvanotechnik GmbH (DE) | 2011-04-20 | — | — | EP | claimed |
| US-20100147696-A1 | COPPER-TIN ELECTROLYTE AND METHOD FOR DEPOSITING BRONZE LAYERS | UMICORE GALVANOTECHNIK GMBH (DE) | 2010-06-17 | — | — | US | claimed |
| US-20100051468-A1 | ELECTROLYTE AND METHOD FOR DEPOSITING DECORATIVE AND TECHNICAL LAYERS OF BLACK RUTHENIUM | UMICORE GALVANOTECHNIK GMBH (DE) | 2010-03-04 | — | — | US | claimed |
| WO-2010003621-A1 | IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS | UMICORE GALVANOTECHNIK GMBH (DE) | 2010-01-14 | — | — | WO | claimed |
| EP-1961840-B1 | Copper-tin electrolyte and method for depositing bronze layers | UMICORE GALVANOTECHNIK GMBH (DE) | 2009-12-30 | — | — | EP | claimed |
| EP-1975282-B1 | Electrolyte and method for electroplating decorative and technical layers of black ruthenium. | UMICORE GALVANOTECHNIK GMBH (DE) | 2009-11-18 | — | — | EP | claimed |
| EP-1975282-A1 | Electrolyte and method for separating decorative and technical layers from black ruthenium | Umicore Galvanotechnik GmbH (DE) | 2008-10-01 | — | — | EP | claimed |
| EP-1961840-A1 | Copper-tin electrolyte and method for depositing bronze layers | Umicore Galvanotechnik GmbH (DE) | 2008-08-27 | — | — | EP | claimed |
| CN-119024654-A | Method for forming pattern | 三星SDI株式会社 | 2024-11-26 | — | — | CN | disclosed |
| EP-1961840-A1 | Copper-tin electrolyte and method for depositing bronze layers | Umicore Galvanotechnik GmbH (DE) | 2008-08-27 | — | — | EP | disclosed |
| US-4006182-A | Process for the preparation of 1-aminoalkane-1,1-diphosphonic acids | HENKEL & CIE G.M.B.H. (DT) | 1977-02-01 | — | — | US | disclosed |