SCHEMBL29319502

SCHEMBL29319502

O=C(O)/C(I)=C(\I)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 5/20 0.48
CES2 O00748 5/20 0.48
TSHR P16473 3/20 0.48
ALDH1A1 P00352 2/20 0.48
DAO P14920 1/20 0.48
NAPRT Q6XQN6 1/20 0.48
TDP1 Q9NUW8 4/20 0.44
CA2 P00918 3/20 0.44
CA12 O43570 3/20 0.44
CA1 P00915 3/20 0.44
CA9 Q16790 3/20 0.44
CYP3A4 P08684 2/20 0.44
MAPT P10636 2/20 0.44
CA4 P22748 2/20 0.44
HSD17B10 Q99714 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
POLB P06746 1/20 0.44
PARP1 P09874 1/20 0.44
CYP2C19 P33261 1/20 0.44
RECQL P46063 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10893693 0.78 CES1 (0.47) CES1CES2TSHRALDH1A1DAO
SCHEMBL10454311 0.78 CES1 (0.47) CES1CES2TSHRALDH1A1DAO
SCHEMBL6527803 0.76 CES1 (0.48) CES1CES2TSHRALDH1A1DAO
SCHEMBL6527794 0.76 CES1 (0.48) CES1CES2TSHRALDH1A1DAO
SCHEMBL672981 0.75
SCHEMBL9579634 0.73 CES1 (0.43) CES1CES2TSHRALDH1A1DAO
SCHEMBL31264146 0.73 CES1 (0.43) CES1CES2TSHRALDH1A1DAO
SCHEMBL24486578 0.70 CES1 (0.41) CES1CES2TSHRALDH1A1DAO
SCHEMBL30096377 0.70 CES1 (0.41) CES1CES2TSHRALDH1A1DAO
SCHEMBL28858493 0.70 CES1 (0.41) CES1CES2TSHRALDH1A1DAO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed