⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16775511 | 0.80 | CYP2C19 (0.60) | — | |
| SCHEMBL12927850 | 0.74 | — | — | |
| SCHEMBL4522865 | 0.73 | — | — | |
| SCHEMBL808505 | 0.71 | TP53 (0.39) | — | |
| Diethylamine SCHEMBL27498522 | 0.71 | — | — | |
| SCHEMBL1858495 | 0.69 | — | — | |
| SCHEMBL2004390 | 0.69 | TSHR (0.52) | — | |
| SCHEMBL18112242 | 0.69 | CYP2C19 (0.40) | — | |
| SCHEMBL4523784 | 0.69 | — | — | |
| SCHEMBL7471058 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10170298-B2 | High temperature silicon oxide atomic layer deposition technology | APPLIED MATERIALS, INC. (US) | 2019-01-01 | — | — | US | disclosed |
| US-20180076023-A1 | High Temperature Silicon Oxide Atomic Layer Deposition Technology | APPLIED MATERIALS INC (US) | 2018-03-15 | — | — | US | disclosed |
| US-9875888-B2 | High temperature silicon oxide atomic layer deposition technology | APPLIED MATERIALS, INC. (US) | 2018-01-23 | — | — | US | disclosed |
| US-20170362247-A1 | PROCESSES FOR THE PREPARATION OF (3S,4R)-3-ETHYL-4-(3H-IMIDAZO[1,2-alpha]PYRROLO[2,3-e]-PYRAZIN-8-YL)-N-(2,2,2-TRIFLUOROETHYL)PYRROLIDINE-1-CARBOXAMIDE AND SOLID STATE FORMS THEREOF | ABBVIE INC. | 2017-12-21 | — | — | US | disclosed |
| US-20160099143-A1 | High Temperature Silicon Oxide Atomic Layer Deposition Technology | APPLIED MATERIALS, INC. | 2016-04-07 | — | — | US | disclosed |
| US-8765667-B2 | HCV protease inhibitors | EISSENSTAT MICHAEL (US) | 2014-07-01 | — | — | US | disclosed |
| WO-2012158413-A2 | PYRROLIDINYL UREA AND PYRROLIDINYL THIOUREA COMPOUNDS AS TRKA KINASE INHIBITORS | ARRAY BIOPHARMA INC. (US) | 2012-11-22 | — | — | WO | disclosed |
| US-20110182854-A1 | HCV PROTEASE INHIBITORS | SEQUOIA PHARMACEUTICALS, INC. (US) | 2011-07-28 | — | — | US | disclosed |
| US-7847117-B2 | Process for preparing alkyl(methoxymethyl)trimethylsilanylmethylamines | WACKER CHEMIE AG (DE) | 2010-12-07 | — | — | US | disclosed |
| EP-2050754-B1 | Method for manufacturing alkyl-methoxymethyl-trimethylsilanylmethyl amines | WACKER CHEMIE AG (DE) | 2010-09-15 | — | — | EP | disclosed |
| EP-2050754-A1 | Method for manufacturing alkyl-methoxymethyl-trimethylsilanylmethyl amines | Wacker Chemie AG (DE) | 2009-04-22 | — | — | EP | disclosed |
| US-20090036700-A1 | Process For Preparing Alkyl(Methoxymethyl)Trimethylsilanylmethylamines | WACKER CHEMIE AG (DE) | 2009-02-05 | — | — | US | disclosed |