⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL755735 | 0.90 | — | — | |
| SCHEMBL5165842 | 0.85 | LMNA (0.30) | — | |
| SCHEMBL499555 | 0.79 | — | — | |
| SCHEMBL755736 | 0.78 | — | — | |
| SCHEMBL195387 | 0.77 | — | — | |
| SCHEMBL9860293 | 0.77 | — | — | |
| SCHEMBL572993 | 0.77 | — | — | |
| SCHEMBL40453 | 0.77 | LMNA (0.42) | — | |
| SCHEMBL292814 | 0.76 | TSHR (0.36) | — | |
| SCHEMBL16149961 | 0.74 | LMNA (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 689 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| EP-4744901-A1 | ON-PRESS DEVELOPMENT TYPE PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, PLANOGRAPHIC PRINTING METHOD, AND COMPOUND | FUJIFILM Corporation (JP) | 2026-05-20 | — | — | EP | disclosed |
| EP-4744902-A1 | ON-PRESS DEVELOPMENT-TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, PLANOGRAPHIC PRINTING PLATE PRODUCTION METHOD, AND PLANOGRAPHIC PRINTING METHO | FUJIFILM Corporation (JP) | 2026-05-20 | — | — | EP | disclosed |
| US-20260131566-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260131567-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING METHOD, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2026-05-14 | — | — | US | disclosed |
| EP-4316850-B1 | ELECTRON BEAM CURING INKJET INK, INK SET, AND IMAGE RECORDING METHOD | FUJIFILM CORP (JP) | 2026-04-22 | — | — | EP | disclosed |
| EP-4286163-B1 | ELECTRON BEAM CURABLE INK, AND IMAGE RECORDING METHOD | FUJIFILM CORP (JP) | 2026-04-01 | — | — | EP | disclosed |
| EP-4186708-B1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING A LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2026-03-04 | — | — | EP | disclosed |
| US-12501540-B2 | Electronic device and manufacturing method thereof | FUJIFILM CORPORATION (JP) | 2025-12-16 | — | — | US | disclosed |
| EP-4660262-A1 | ACTIVE ENERGY RAY-CURABLE INKJET INK, ACTIVE ENERGY RAY-CURABLE INK SET, AND IMAGE RECORDING METHOD | FUJIFILM Corporation (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20060258776-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJI PHOTO FILM CO., LTD. | 2006-11-16 | — | — | US | disclosed |
| EP-1721943-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2006-11-15 | — | — | EP | disclosed |
| US-20060211785-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJI PHOTO FILM., LTD. | 2006-09-21 | — | — | US | disclosed |
| EP-1702962-A1 | Ink composition containing a photo-acid and a photo-base generator and processes using them | Fuji Photo Film Co., Ltd. (JP) | 2006-09-20 | — | — | EP | disclosed |
| US-20060194029-A1 | Ink composition, inkjet recording method using the same, and printed material | FUJI PHOTO FILM CO., LTD. | 2006-08-31 | — | — | US | disclosed |
| US-20060178449-A1 | Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate | FUJI PHOTO FILM CO., LTD. | 2006-08-10 | — | — | US | disclosed |
| US-20060174799-A1 | including a cationically polymerizable compound, a compound that generates acid by irradiation with a radiation ray, and a basic compound that becomes less basic by irradiation with a radiation ray; curable with high sensitivity to a radiation ray | FUJI PHOTO FILM CO., LTD. | 2006-08-10 | — | — | US | disclosed |
| EP-1688468-A1 | Ink composition and planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-09 | — | — | EP | disclosed |
| EP-1688467-A1 | Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate | Fuji Photo Film Co., Ltd. (JP) | 2006-08-09 | — | — | EP | disclosed |