Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | S100B | P04271 | 1/20 | 1.00 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.54 |
| ▸ | GFER | P55789 | 3/20 | 0.54 |
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.54 |
| ▸ | RECQL | P46063 | 1/20 | 0.54 |
| ▸ | TERT | O14746 | 1/20 | 0.47 |
| ▸ | SKP2 | Q13309 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 2/20 | 0.44 |
| ▸ | IGLV6-57 | P01721 | 1/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
| ▸ | CASP7 | P55210 | 1/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL34104 | 1.00 | S100B (1.00) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| Hydrochloric Acid SCHEMBL2136137 | 0.98 | S100B (0.96) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| Hydrochloric Acid SCHEMBL3385174 | 0.98 | S100B (0.96) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| Hydrochloric Acid SCHEMBL28014084 | 0.96 | S100B (0.92) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| Hypochlorous Acid SCHEMBL6550511 | 0.94 | S100B (0.89) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| SCHEMBL9405180 | 0.93 | S100B (0.86) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| SCHEMBL11579110 | 0.93 | S100B (0.86) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| SCHEMBL33702 | 0.92 | S100B (0.85) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| SCHEMBL29381855 | 0.92 | S100B (0.85) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 | |
| Hydrochloric Acid SCHEMBL11220218 | 0.91 | S100B (0.83) | S100BALDH1A1MAPK1CYP3A4L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116490533-B | Pigment dispersion composition and photosensitive coloring composition | 株式会社力森诺科 | 2025-06-13 | — | — | CN | disclosed |
| CN-119836443-A | Copolymer, photosensitive resin composition, resin cured film, and image display element | 株式会社力森诺科 | 2025-04-15 | — | — | CN | disclosed |
| CN-119592136-A | Pigment dispersion composition for black matrix | 阪田油墨株式会社 | 2025-03-11 | — | — | CN | disclosed |
| CN-118667391-A | Pigment dispersion composition for black matrix | 阪田油墨株式会社 | 2024-09-20 | — | — | CN | disclosed |
| CN-118265757-A | Pigment dispersion composition, photosensitive coloring composition, and color filter | 株式会社力森诺科 | 2024-06-28 | — | — | CN | disclosed |
| CN-118235090-A | Photosensitive resin composition and color filter | 株式会社力森诺科 | 2024-06-21 | — | — | CN | disclosed |
| CN-117980368-A | Resin precursor, resin composition, and resin cured film | 株式会社力森诺科 | 2024-05-03 | — | — | CN | disclosed |
| CN-110998443-B | Photosensitive resin composition and method for producing same | 株式会社力森诺科 | 2024-03-26 | — | — | CN | disclosed |
| CN-114539468-B | Method for producing copolymer | 株式会社力森诺科 | 2023-11-10 | — | — | CN | disclosed |
| CN-116948463-A | Dispersion for black partition wall material | 阪田油墨株式会社 | 2023-10-27 | — | — | CN | disclosed |
| CN-114730129-A | Photosensitive resin composition and image display device | 昭和电工株式会社 | 2022-07-08 | — | — | CN | disclosed |
| WO-2022138173-A1 | COPOLYMER, AND METHOD FOR PRODUCING SAID COPOLYMER | 昭和電工株式会社 | 2022-06-30 | — | — | WO | disclosed |
| WO-2022138159-A1 | COPOLYMER AND METHOD FOR PRODUCING SAME | 昭和電工株式会社 | 2022-06-30 | — | — | WO | disclosed |
| CN-111032720-B | Resin, photosensitive resin composition, resin cured film, and image display device | 昭和电工株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-114539468-A | Method for producing copolymer | 昭和电工株式会社 | 2022-05-27 | — | — | CN | disclosed |
| WO-2022102368-A1 | PIGMENT DISPERSION COMPOSITION AND PHOTOSENSITIVE COLORING COMPOSITION | 昭和電工株式会社 | 2022-05-19 | — | — | WO | disclosed |
| WO-2022102367-A1 | POLYMERIZABLE POLYMER DISPERSANT, PIGMENT DISPERSION COMPOSITION, AND PHOTOSENSITIVE COLORING COMPOSITION | 昭和電工株式会社 | 2022-05-19 | — | — | WO | disclosed |
| WO-2022085389-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTER | 昭和電工株式会社 | 2022-04-28 | — | — | WO | disclosed |
| CN-111278912-B | Polymer composition, photosensitive resin composition, and color filter | 昭和电工株式会社 | 2022-03-04 | — | — | CN | disclosed |
| CN-113966489-A | Photosensitive resin composition, cured resin film and image display element | 昭和电工株式会社 | 2022-01-21 | — | — | CN | disclosed |