⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2400356 | 0.84 | — | — | |
| SCHEMBL12796176 | 0.73 | — | — | |
| SCHEMBL1277383 | 0.72 | — | — | |
| SCHEMBL20543231 | 0.72 | — | — | |
| SCHEMBL12796056 | 0.70 | — | — | |
| SCHEMBL12796173 | 0.69 | — | — | |
| SCHEMBL280547 | 0.68 | EPHX2 (0.32) | — | |
| SCHEMBL61154 | 0.68 | LMNA (0.32) | — | |
| SCHEMBL12796059 | 0.68 | — | — | |
| SCHEMBL12796075 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12449731-B2 | Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed product | ISR CORPORATION (JP) | 2025-10-21 | — | — | US | disclosed |
| WO-2025041686-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| WO-2025041685-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCING PLATED MOLDED ARTICLE, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| CN-112534353-B | Photosensitive resin composition, method for forming resist pattern, method for producing plated molded article, and semiconductor device | JSR株式会社 | 2024-12-24 | — | — | CN | disclosed |
| US-12174538-B2 | Photosensitive resin composition, method for producing resist pattern film, method for producing plated formed product, and method for producing tin-silver plated-formed product | JSR CORPORATION (JP) | 2024-12-24 | — | — | US | disclosed |
| US-12158700-B2 | Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus | JSR CORPORATION (JP) | 2024-12-03 | — | — | US | disclosed |
| WO-2024190595-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2024-09-19 | — | — | WO | disclosed |
| US-20230036031-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, METHOD FOR PRODUCING PLATED FORMED PRODUCT, AND METHOD FOR PRODUCING TIN-SILVER PLATED-FORMED PRODUCT | JSR CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| US-20220057714-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT | JSR CORPORATION (JP) | 2022-02-24 | — | — | US | disclosed |
| US-20220035246-A1 | METHOD FOR PRODUCING PLATED FORMED PRODUCT | JSR CORPORATION (JP) | 2022-02-03 | — | — | US | disclosed |
| US-20220026802-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT | JSR CORPORATION (JP) | 2022-01-27 | — | — | US | disclosed |