SCHEMBL29359489

SCHEMBL29359489

CC[Si](CC)(CC)OF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9425908 0.67
SCHEMBL44376 0.67
SCHEMBL16918639 0.67
SCHEMBL3422065 0.67
SCHEMBL1695978 0.65
SCHEMBL13621404 0.65
SCHEMBL13621407 0.65
SCHEMBL412520 0.64
SCHEMBL25313126 0.61
SCHEMBL5936772 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109650326-B MEMS device and method of manufacturing the same 杭州士兰集成电路有限公司 2024-10-11 CN claimed
US-20260100716-A1 Antirelaxation Coatings for Vapor Cells Quantum Valley Ideas Laboratories (CA) 2026-04-09 US disclosed
US-20260098877-A1 Absorbing Gas Species from a Cavity of a Vapor Cell Quantum Valley Ideas Laboratories (CA) 2026-04-09 US disclosed
US-20260099125-A1 Forming Antirelaxation Coatings on Interior Surfaces of Vapor Cells Quantum Valley Ideas Laboratories (CA) 2026-04-09 US disclosed
US-20250373966-A1 MEMS DEVICE AND METHOD FOR FABRICATING A MEMS DEVICE INFINEON TECHNOLOGIES AG (DE) 2025-12-04 US disclosed
EP-4656587-A1 MEMS DEVICE AND METHOD FOR FABRICATING A MEMS DEVICE Infineon Technologies AG (DE) 2025-12-03 EP disclosed
US-20250162859-A1 OUTGASSING MATERIAL COATED CAVITY FOR A MICRO-ELECTRO MECHANICAL SYSTEM DEVICE AND METHODS FOR FORMING THE SAME TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED (TW) 2025-05-22 US disclosed
CN-119617307-A Additive metering system and control method thereof 中广核工程有限公司 2025-03-14 CN disclosed
US-12234141-B2 Outgassing material coated cavity for a micro-electro mechanical system device and methods for forming the same TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED (TW) 2025-02-25 US disclosed
CN-119050016-A XeF2 etching equipment and use method 唐云俊 2024-11-29 CN disclosed
CN-112897454-B MEMS device and method of manufacturing the same 杭州士兰集成电路有限公司 2024-02-23 CN disclosed
US-11827513-B2 Outgassing material coated cavity for a micro-electro mechanical system device and methods for forming the same TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED (TW) 2023-11-28 US disclosed
US-20230375416-A1 Micro-Electro-Mechanical System (Mems) Thermal Sensor TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD (TW) 2023-11-23 US disclosed
US-20230365398-A1 OUTGASSING MATERIAL COATED CAVITY FOR A MICRO-ELECTRO MECHANICAL SYSTEM DEVICE AND METHODS FOR FORMING THE SAME TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED (TW) 2023-11-16 US disclosed
US-11796396-B2 Micro-electro-mechanical system (MEMS) thermal sensor TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-10-24 US disclosed
CN-116887629-A Organic light emitting display device and method of manufacturing the same 三星显示有限公司 2023-10-13 CN disclosed
US-11758768-B2 Organic light-emitting display apparatus comprising self-assembled layer containing fluorine SAMSUNG DISPLAY CO., LTD. (KR) 2023-09-12 US disclosed
CN-116598317-A Method for improving bias stress stability of indium zinc oxide thin film transistor 华南理工大学 2023-08-15 CN disclosed
CN-108573996-B Organic light emitting display device and method of manufacturing the same 三星显示有限公司 2023-08-11 CN disclosed
US-20220024756-A1 OUTGASSING MATERIAL COATED CAVITY FOR A MICRO-ELECTRO MECHANICAL SYSTEM DEVICE AND METHODS FOR FORMING THE SAME TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED (TW) 2022-01-27 US disclosed