SCHEMBL3422065

SCHEMBL3422065

CC[Si](CC)(CC)O[Hf](O[Si](CC)(CC)CC)(O[Si](CC)(CC)CC)O[Si](CC)(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29359489 0.67
SCHEMBL9425908 0.65
SCHEMBL44376 0.65
SCHEMBL1695978 0.62
SCHEMBL13621407 0.62
SCHEMBL13621404 0.62
SCHEMBL412520 0.62
SCHEMBL25313126 0.59
SCHEMBL159771 0.59
SCHEMBL301538 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8197601-B2 Vaporizer, vaporization module and film forming apparatus TOKYO ELECTRON LIMITED (JP) 2012-06-12 US disclosed
US-20100006033-A1 VAPORIZER, VAPORIZATION MODULE AND FILM FORMING APPARATUS TOKYO ELECTON LIMITED (JP) 2010-01-14 US disclosed
US-20090229525-A1 VAPORIZER AND FILM FORMING APPARATUS TOKYO ELECTRON LIMITED (JP) 2009-09-17 US disclosed
EP-1724817-A1 FILM FORMING APPARATUS TOKYO ELECTRON LIMITED (JP) 2006-11-22 EP disclosed
US-20050223987-A1 Film forming apparatus TOKYO ELECTRON LIMITED (JP) 2005-10-13 US disclosed
US-20050081787-A1 Apparatus and method for supplying a source, and method of depositing an atomic layer using the same IM KI-VIN (KR) 2005-04-21 US disclosed